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Investigation of Photo-degradation mechanism of semiconductor-organic material interface

Investigation of Photo-degradation mechanism of semiconductor-organic material interface
半导体-有机材料界面光降解机理研究
批准号:
61850146
负责人:
FUJISHIMA Akira
金额:
$5.95万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Developmental Scientific Research
财政年份:
1986
资助国家:
日本
项目状态:
已结题
起止时间:
1986 至 1988

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中文摘要
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英文摘要
Semiconductor materials are now very important in various fields. Some of their properties such as photosensitive properties have not been well understood.We have investigated photodegradation of organic materials in which semiconductor materials such as small powders are included. Since we have enough experiences for electrochemical phenomena of photoexcited semiconductor-liquid interfaces, photoelectrochemical techniques have been employed. At first, photocatalytic activity of semiconductor surface was measured by using of semiconductor electrode insulated with oeganic layers. Photocurrent at the constant applied vias increased with irradiation time indicating that photoexcited holes formed in the valence band extracted electrons from the organic molecules. Therefore, the organic molecules were oxidized and degraded. Secondly we studied a new method named as photosinking for estimation of photocatalytic activity of semiconductor powders which were coated with some organic molecules with hydrophobic character. From the photosinking rate photocatalytic activity has been estimated.
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通讯作者:
P.Chen: J.Imaging Science. 31. 60-63 (1987)
陈鹏:影像科学杂志。
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K.Itoh: Chem.Lett.2125-2128 (1987)
K.Itoh:Chem.Lett.2125-2128 (1987)
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通讯作者:
M. Okano: "Incorpration of Dye Molecules in Polypyrrole Films in the Process of Photoelectrochemical Deposition" Chem. Lett.2129-2130 (1987)
M. Okano:“光电化学沉积过程中染料分子在聚吡咯薄膜中的结合”Chem。
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