Direct-writing laser lithography system (DLLS)

纳米结构中心是加州大学凯泽斯劳滕分校的核心研究设施，并作为服务中心运营。它已经拥有了大量的设备，用于基片和层的微结构和纳米结构。本文提出的直写激光光刻系统旨在弥补掩模紫外光刻和直写电子束光刻之间的差距。通过对紫外光敏感抗蚀剂进行直写激光光刻的无掩模光刻技术的应用，使得层状结构的快速成型成为可能。此外，在该机构，首次在光刻胶或层中生产三维(3D)结构，而不需要花费大量时间和成本生产灰度级或光刻掩模。由于部分用电子束和部分用激光光刻(混合和匹配)写入结构，可以更快地生产样品，成本密集度更低。纳米结构中心正在与来自物理、电气工程和信息技术系的其他三个研究小组合作申请激光光刻系统。参与小组正在进行微光学器件、微谐振器和太赫兹超材料以及半导体激光器和微流体微透镜的横模选择等领域的研究。最初，这些团队打算将激光光刻系统主要用于‘快速成型’，然后还用于直接在光刻胶中生产3D结构。在激光光刻系统获得批准并安装后，纳米结构中心将进行工艺开发和优化。该系统的用户将得到相应的指导，并支持制定和优化进一步的流程。所需的工作人员长期受雇于纳米结构中心，在照片和电子束光刻领域拥有多年的经验。

The Nano Structuring Center is a core research facility at the TU Kaiserslautern and is run as a service center. It already has extensive equipment for micro- and nanostructuring of substrates and layers. The direct-writing laser-lithography system as proposed here is intended to bridge the gap between mask-using UV-photolithography and direct-writing electron beam lithography. With the application of maskless lithography via direct writing laser lithography of UV-sensitive photoresists, rapid prototyping of layered structures becomes possible. Also, for the first time at this institution, the production of 3-dimensional (3D) structures in photoresists or layers without the time- and cost-intensive production of grayscale or photolithographic masks becomes feasible. As a result of structures being written partially with electron beam and partially with laser lithography ("mix and match"), samples can be produced faster and less cost intensive.The Nano Structuring Center is applying for the laser-lithography system in a collaborative effort along with three other research groups from the departments of Physics and Electrical Engineering and Information Technology. The participating groups are conducting research in the fields of micro-optical devices, micro resonators and terahertz-based metamaterials as well as transverse-mode selection of semiconductor lasers and microfluidic micro lenses. Initially, these groups are intending to use the laser lithography system primarily for 'rapid prototyping' and, later on, also for the production of 3D structures directly in photoresists. After approval and installation of the laser lithography system, the Nano Structuring Center will carry out process development and optimization. Users of the system will be instructed accordingly and supported with the development and optimization of further processes. The necessary staff are permanently employed to the Nano Structuring Center with many years of experience in the fields of photo and electron beam lithography.