Preparation of Amorphous Thin Films by Reactive Sputtering and Material design

点击翻译按钮获取中文摘要

Amorphous thin films were prepared by reactive sputtering in O_2/Ar atmospheres with several new ceramic targets such as silicide and boride. One of these targets was a molybdenum-silicide (MoSi_2) used in this study. In addition to the MoSi_2 compound target, three other kinds of target (a composite, a Mo and a Si target) were used in this study. The composite target was composed of Mo and Si pieces. Then an analysis of the relations between sputtering rates of these four targets, the rates of both the MoSi_2 target and the composite target could be calculated by those from the Mo and the Si targets taking surface atomic density into consideration. Since it is important to estimate the composition and properties of films prepared by reactive sputtering with multi-component targets on the basis of information using single-component targets, it seems that these results were useful from viewpoint of material design.