X-Ray Spectroscopy with Multilayr Loated Gratings

在超高真空中，用电子束沉积法在浮法玻璃和平板光栅（槽数1200/mm，深度100 A; 1200/mm，深度200 A; 500/mm，深度400 A）上沉积了Pt/C多层膜（2d= 80 A，N=20和2d= 100 A，N=10）。它们的X-射线光学性质进行了评估，使用特征X-射线在我们的实验室和单色同步辐射在UVSOR，分子科学研究所。在液氮温度下沉积在浮法玻璃上的多层膜的X射线反射率高于室温下的X射线反射率，而光栅的X射线反射率则相反。用原子力显微镜（AFM）观察表面粗糙度，证实了这一事实。可以理解，多层膜的内应力取决于基底的表面结构。多层膜前在基体上沉积较厚的Cr缓冲层，可显著降低X射线反射率。用单色化同步辐射测量了能量为1.2，1.7，2，02.8keV的多层膜光栅的X射线反射率，并与理论计算值进行了比较。结果表明，对于一定的X射线能量，光栅的槽深应进行优化，以获得最高的反射率。

Pt/C multilayrs (2d=80A,N=20 and 2d=100A,N=10) were deposited on float glass and laminar gratings (groove number 1200/mm, depth 100A ; 1200/mm, 200A ; 500/mm, 400A) by means of an electron beam deposition method in ultra-high vacuum. Their x-ray optical properties were evaluated using characteristic x-rays in our laboratory and monochromatized synchrotron radiation at UVSOR,Institute for Molecular Science. X-ray reflectivity of multilayrs deposited on float glass at liquid nitrogen temperature is higher than those at room temperature, and vice versa for gratings. This fact is clarified by observing the surface roughness with atomic force microscope (AFM). It is understood that the internal stress of multilayrs depend on the surface structure of substrates. The thicker buffer layr of Cr deposited on substrate before multilayr coating considerably reduces x-ray reflectivity. Ion beam irradiation on deposited surface is not so effective to get high reflectivity, which is supposed to improve the interfacial roughness.X-ray reflectivity of multilayred gratings was measured at the energy 1.2,1.7,2,02.8 keV by monochromatized synchrotron radiation, which was compared with calculated values. It turns out that the groove depth of gratings should be optimized for a certain x-ray energy to get the highest reflectivity.