Fundamental Research for Development of CVD Apparatus with Rotating Subatrate

旋转基片CVD装置研制基础研究

• 批准号: 05453094
• 负责人: OGINO Fumimaru
• 金额: $ 3.26万
• 依托单位: KYOTO UNIVERSITY
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for General Scientific Research (B)
• 财政年份: 1993
• 资助国家: 日本
• 起止时间: 1993 至 1994
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/en/grant/KAKENHI-PROJECT-05453094/
• 关键词: CVD Apparatus; Stagnation Flow; Rotating Disk Flow; Boundary Layr; 回転円板; 局所伝熱係数; 熱伝達特性; 循環流; 強制対流伝熱; 自然対流伝熱

In conventional CVD systems material gas is usually supplied along a substrate. In this case the boundary layr thickness changes along flow direction and thus it is difficult to make a uniform thin film. On the other hand it has been found that the boundary layr thickness becomes constant on a rotating disk. This fact can be used for the development of a new system in which we can easily control the uniformity of thin films. In order to develop a new CVD apparatus with a rotating substrate, we investigated experimentally flow and heat transfer on a rotating disk in a cylindrical chamber. From experiments we get the following results :1. The critical Reynolds number at which transition from laminar to turbulent flow occurs on the disk is about 2 ? B3 10^5.2. Circulation flows are observed between inlet and disk in the case of small inflow rate.3. At low rotating speeds the heat transfer between fluid and disk depends on inflow rate. On the contrary, at high rotating speesd the heat transfer depends on its speed.4. The local heat transfer coefficient becomes constant at the rotational Reynolds number less than 2 ? B3 10^5.

在传统的CVD系统中，材料气体通常沿着衬底供应。在这种情况下，边界层厚度沿着流动方向变化，因此难以形成均匀的薄膜。另一方面，已经发现，边界层厚度在旋转盘上变得恒定。这一事实可以用于开发一种新的系统，在该系统中，我们可以很容易地控制薄膜的均匀性。为了开发一种新型的旋转基片CVD装置，我们对圆柱形腔室中旋转圆盘上的流动和传热进行了实验研究。实验结果表明：1.临界雷诺数从层流过渡到湍流发生在磁盘上是约2？B3 10^5.2。在小流量下，进口与盘之间存在环流.在低转速下，流体与盘之间的热传递取决于流入速率。相反，在高转速下，传热量取决于转速.局部换热系数在旋转雷诺数小于2时为常数。B3 10^5。

项目成果

F.Ogino: "Turbulent Flow of Liquid in a Rotating Vertical Cylindrical Container with a Stationary Solid Cylinder at the Liquid Surface" Ninth Symposium on Turbulent Shear Flows. 30.1.1-30.1.6 (1993)

F.Ogino：“在液体表面具有固定固体圆柱体的旋转垂直圆柱形容器中的液体湍流”第九届湍流剪切流研讨会。

F.Ogino: "Heat Transfer in Liquid in a Cylindrical Container with a Rotating Disc at the Liquid Surface" Proc.of 10th Int.Heat Transfer Conf.(発表予定). (1994)

F.Ogino：“液体表面带有旋转盘的圆柱形容器中的传热”，第 10 届国际传热会议论文集（即将发表）。

F.Ogino: "Heat Transfer in Liquid in a Cylindrical Container with a Rotating Disc at the Liquid Surface" Proc.of the Tenth International Heat Transfer Conference,Brighton,UK. 303-308 (1994)

F.Ogino：“液体表面带有旋转盘的圆柱形容器中的液体传热”，第十届国际传热会议记录，英国布莱顿。

F.Ogino,K.Kawai and Y.Sato: "Heat Transfer In Liquid in a Cylindrical Container With a Rotating Disc at the Liquid Surface" Proc.of the Tenth Internatinal Heat Transfer Conference,Brighton,Uk. 303-308 (1994)

F.Ogino、K.Kawai 和 Y.Sato：“液体表面带有旋转盘的圆柱形容器中的液体传热”第十届国际传热会议论文集，英国布莱顿。

F.Ogino: "Turbulent Flow of Liqiud in a Rotating Vertical Cylindrical Container with a Stationary Solid Cylinder at the Liquid Surface" Ninth Symposium on Turbulent Shear Flows,Kyoto,Japan. 30・1・1-30・1・6 (1993)

F.Ogino：“在液体表面具有固定固体圆柱体的旋转垂直圆柱形容器中的液体湍流”第九届湍流剪切流研讨会，日本京都30・1・1-30・1・6（1993）。