Study on Negative Ion Implantation for the Surface Modification of Polymer Materials without Defects for Bio-compatibilty Control

1.负离子源和负离子注入器的开发：我们开发了一种强射频等离子溅射型重负离子源（RFNIS），它可以在直流模式下输送强度为几毫安的各种元素（如碳、硅、铜、银、氟和氧）的大电流负离子束。此外，我们还开发了配备小型RFNIS的中电流型负离子植入器，其清洁的展台使得离子植入在清洁的条件下以及在真实的植入过程中进行。负离子注入过程中绝缘子表面电位测量方法的发展通过分析二次电子能量分布，提出了一种测量绝缘子表面充电电压的新方法。研究发现，聚乙烯和聚苯乙烯板的负离子注入绝缘子的表面充电电位在几至10伏之间。此外，我们还提出了一种电双层m…More模型，作为负离子注入过程中绝缘子的低充电机制。聚苯乙烯表面接触角的研究及引入官能团的检测正氩、氧离子注入后，注入聚苯乙烯与纯水的接触角随剂量的增加而减小。相反，碳负离子注入后，夹角增大。一点。从XPS测量结果可以清楚地看出，在聚苯乙烯的植入表面引入了C-O、C=0和O=C-O的几个官能团。这些官能团的存在导致了氩注入和氧注入的接触角减小。但在碳离子注入中，认为表面碳原子的增加会影响聚苯乙烯表面接触角的增加。粉末非散射注入方法的研究进展通过正离子注入理论和实验阐明了粉末在注入过程中的散射现象。相反，即使在能量为20kev的负离子注入中，也没有产生散射。这说明负离子注入是一种非散射注入方法。少

1.Development of Negative-Ion Source and Negative-Ion implanter :We developed an intense RF plasma-sputter-type heavy negative-ion source (RFNIS) which can deliver hight-current negative-ion beams in a dc-mode with an intensity of several mA of various elements, such as Carbon, Silicon, Copper, Silver, Fluorine, and Oxygen. Besides, we also developed a medium-current type negative-ion implanter equipped a small-type RFNIS,of which a clean booth makes to implant ions in the clean condition as well as in the real implantation process.2.Development of a Method to Measure Surface Potential of Insulators during Negative-Ion ImplantationWe developed a new method to measure the charging voltage of insulator surface by the analysis of secondary electron energy distribution. It was found that the surface charging potential of negative-ion implanted insulators of polyethylene and polystirene plates was in the range form several to 10 volts negative. Besides, we proposed an electric double layr m … More odel as a low charging mechanism of insulators during negative-ion implantation.3.Investigation of the Contact Angle of Polystirene Surface and Detection of Introduced functional groupsBy the positive argon and oxygen ion implantation, the contact angle against pure water of the implanted polystirene decreased with an increase of the dose. On the contrary, by the carbon negative-ion implantation, the angle increased. a little. It was clear from the results of XPS measurements that several functional groups of C-O,C=0, and O=C-O were introduced in the implanted surface of polystirene. Then these functional groups resulted the decrease of contact angle for argon and oxygen implantation.. But in carbon ion implantation, it is considered that the increase of carbon atom at the surface will be affect to the increase of contact angle of polystirene surface.4.Development of Non-Scattering Implantation Method into PowdersWe clarified the scattering phenomenon of powders during implantation by theoretically and experimentally with a positive ion implantation. On the contrary, even in the negative-ion implantation with an energy of 20 keV,there was no scattering resulted. This shows the negative-ion implantation is non scattering implantation method. Less