High-peak gas pulsed plasma

通过脉冲注入氢气到紧凑型电子回旋共振（ECR）等离子体枪的短等离子体脉冲的创建的特征在于，以澄清所涉及的机制。停止注氢后得到的脉冲等离子体的峰值强度达到常规恒定ECR等离子体峰值强度的20倍。与传统的恒定等离子体不同，强度随着氢气供应的增加而线性增加。这些表明，等离子体产生的有效机制是实现与气体脉冲注入。基于等离子体强度对氢源的依赖性和微波功率消耗的测量，我们提出了一种机制，该机制涉及两个正反馈过程，即等离子体中高激发态氢物种的增加和等离子体-微波耦合的改善。前一个过程最初是由于停止氢注入后等离子体与中性粒子之间的碰撞受到抑制而引起的。为了支持这一机制，还给出了氮气/氦气脉冲等离子体的电子温度（Te）、电子密度（Ne）和发射光谱。

The creation of short plasma pulses by the pulse injection of hydrogen gas to a compact electron cyclotron resonance (ECR) plasma gun is characterised in order to clarify the mechanisms involved. The peak intensity of the pulse plasma obtained after stpping the hydrogen injection reaches up to 20 times as high as the maximum achievable in the conventinal constant ECR plasma. The intensity increased linearly with increasing hydrogen supply, unlike in the conventional constant plasma. These suggest that an effective mechanism of plasma creation is realized with gas-pulse injection. Based on the dependence of the plasma intensity on hydrogen supply and the measurement of microwave power consumption, we propose a mechanism which involves two positive-feedback processes, namely, an increase in highly excited hydrogen species in plasma and the improvement of plasma-microwave coupling. The former process is initially caused by the suppression of collisions between plasma and neutrals after stopping the hydrogen injection. Electron temperature (Te), electron density (Ne), and emission spectra were also preseneted for nitrogen/helium gas-pulsed plasma, in order to support the mechanism.