High-peak gas pulsed plasma

高峰值气体脉冲等离子体

• 批准号: 06452225
• 负责人: OZASA Kazunari
• 金额: $ 3.65万
• 依托单位: The Institute of Physical and Chemical Research (RIKEN)
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for General Scientific Research (B)
• 财政年份: 1994
• 资助国家: 日本
• 起止时间: 1994 至 1995
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/en/grant/KAKENHI-PROJECT-06452225/
• 关键词: plasma; gas-pulsed plasma; plasma pulse; hydrogen plasma; helium plasma; ion current; optical emission; electron temperature; 窒素プラズマ; DMAH; 選択成長

The creation of short plasma pulses by the pulse injection of hydrogen gas to a compact electron cyclotron resonance (ECR) plasma gun is characterised in order to clarify the mechanisms involved. The peak intensity of the pulse plasma obtained after stpping the hydrogen injection reaches up to 20 times as high as the maximum achievable in the conventinal constant ECR plasma. The intensity increased linearly with increasing hydrogen supply, unlike in the conventional constant plasma. These suggest that an effective mechanism of plasma creation is realized with gas-pulse injection. Based on the dependence of the plasma intensity on hydrogen supply and the measurement of microwave power consumption, we propose a mechanism which involves two positive-feedback processes, namely, an increase in highly excited hydrogen species in plasma and the improvement of plasma-microwave coupling. The former process is initially caused by the suppression of collisions between plasma and neutrals after stopping the hydrogen injection. Electron temperature (Te), electron density (Ne), and emission spectra were also preseneted for nitrogen/helium gas-pulsed plasma, in order to support the mechanism.

为了阐明所涉及的机制，对脉冲注入氢气到紧凑型电子回旋共振(ECR)等离子体枪产生的短等离子体脉冲进行了表征。停止注氢后获得的脉冲等离子体的峰值强度可达常规恒定ECR等离子体的最大值的20倍。与传统的恒定等离子体不同，这种强度随着氢气供应的增加而线性增加。这表明，气体脉冲注入是实现等离子体产生的一种有效机制。基于等离子体强度对氢气供应的依赖关系和微波功率消耗的测量，我们提出了一种包括两个正反馈过程的机制，即等离子体中高激发态氢物种的增加和等离子体-微波耦合的改善。前者最初是由于停止注氢后等离子体与中性体之间的碰撞被抑制所致。为了支持这一机理，还给出了氮气/氦气脉冲等离子体的电子温度(Te)、电子密度(Ne)和发射光谱。

项目成果

Kazunari OZASA: "Generation of high-peak pulse beam of hydrogen plasma fon use in short-pulsed chewical beam epitaxy" Applied Physics Letters. 64. 2220-2222 (1994)

Kazunari OZASA：“用于短脉冲咀嚼束外延的氢等离子体高峰值脉冲束的生成”应用物理快报。

Kazunari OZASA: "Tewpoval evolution of hydrogen plasma produced with gas pulse injection scheme" Surface Coating Technology. 74. 345-350 (1995)

Kazunari OZASA：“通过气体脉冲注入方案产生氢等离子体的 Tewpoval 演化”表面涂层技术。

Kazunari OZASA: "Generation of high-peak pulse beam of hydrogen plasma for the use in short-pulsed chemical beam epitaxy" Applied Physics Letters. 64. 2220-2222 (1994)

Kazunari OZASA：“用于短脉冲化学束外延的氢等离子体高峰值脉冲束的生成”《应用物理快报》。

Kazunari OZASA: "Temporal evolution of hydrogen plasma produced with gas pulse injection scheme" Surface and Coatings Technology. 74. 345-350 (1995)

Kazunari OZASA：“通过气体脉冲注入方案产生的氢等离子体的时间演化”表面和涂层技术。

Kazunari OZASA: "Selective Epitaxy with in Situ mask processing and pulse plasma" Advances in Colloid and Interface Surface. (発表予定).

Kazunari OZASA：“采用原位掩模处理和脉冲等离子体的选择性外延”胶体和界面表面的进展（待提交）。