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Development of Znse Blue Light Emitting Devices by Metalorganic Molecular Beam Epitaxy(MOMBE)

Development of Znse Blue Light Emitting Devices by Metalorganic Molecular Beam Epitaxy(MOMBE)
金属有机分子束外延(MOMBE)开发Znse蓝光发光器件
批准号:
60460060
负责人:
KASAI Haruo
金额:
$4.86万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for General Scientific Research (B)
财政年份:
1985
资助国家:
日本
项目状态:
已结题
起止时间:
1985 至 1987

项目摘要

项目成果

KASAI Haruo的其他基金

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中文摘要
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英文摘要
ZnSe, which is one of the most promising semiconductors for blue light-emitting-diodes, has been grown by Metalorganic Molecular Beam Epitaxy(MOMBE) using Dimethylzinc (DMZn) and H_2Seas reactans.In MOMBE, since the filmsu are grown at low temperature in a clean atmosphere,growth of very high-quality crystals can be expected.Furthermore,sinceZnSe films are grown under high-vaccum condition,"premature reaction"in gas-phase,that is one of the serious problem in conventional MOCVD,can be avoidable in MOMBE.We have investigated MOMBE growth of ZnSe and obtained several important results as followings,1.The MOMBE system developed in this work has a turbo-molecular-pump and l sccm Mass-Flow-Control-ler in order to achieve the growth under high-vaccum condition.Furthermore,it has a quadru-pole mass spectometer(QMS)and cracking cells.2.Pyrolysis of source-gases in the cracking cell has been examind by using QMS.It was found that DMZn and H_2Se completely dissociate into Zn and Se_2 at cracking temperature of 860゜C and 680゜C,resperctively.3.Growth kinetics of ZnSe films has been studied through investigating the effects of sourcegas cracking on the growth rates of the films.It was shown that the cracking of source-gases drastically affects both the growth kinetics and surface morphology of the films.4.When the source gases are cracked,very smooth and featureless surface can be achieved in MOMBE.Furthermore, through the examinations of low-temperature photoluminescence properties it was found that relatively high-quality ZnSe films can be obtained.
期刊论文(32)
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会议论文
Akihiko Yoshikawa: "Growth Mechanism of ZnSe Films in Low-Pressure MOCVD" Japanese Journal of Applied Physics. 25. 673-678 (1986)
Akihiko Yoshikawa:“低压 MOCVD 中 ZnSe 薄膜的生长机制”日本应用物理学杂志。
DOI: --
发表时间:
期刊:
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作者: []
通讯作者:
Akihiko Yoshikawa: "Growth of Low-Resistivity High-Quality ZnS Films by Low-pressure Metalorganic Chemical Vapor Deposition" Journal of Crystal Growth. 72. 13-16 (1985)
Akihiko Yoshikawa:“通过低压金属有机化学气相沉积生长低电阻率高质量 ZnS 薄膜”晶体生长杂志。
DOI: --
发表时间:
期刊:
影响因子: --
作者: []
通讯作者:
A.Yoshikawa: Japanese Journal of Applied Physics. 25. 673-678 (1986)
A.Yoshikawa:日本应用物理学杂志。
DOI: --
发表时间:
期刊:
影响因子: --
作者: []
通讯作者:
Akiko Yoshikawa: Journal of Crystal Growth. 86. 279-284 (1988)
Akiko Yoshikawa:晶体生长杂志。
DOI: --
发表时间:
期刊:
影响因子: --
作者: []
通讯作者:
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