NEW METHOD OF FABRICATION AND APPLICATION OF DIELECTRIC-COATED WAVEGUIDES FOR INFRARED

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1. NEW METHOD OF FABRICATING DIELECTRIC-COATED HOLLOW WAVEGUIDES(1) FABRICATION BASED ON RF-SPUTTERINGTO FABRICATE DIELECTRIC-COATED METALLIC WAVEGUIDES BASED ON RF-SPUTTERING, ELECTROPLATING, AND ETCHING TECHNIQUES, THE ELECTROPLATING PROCESS IS THE MOST ESSENTIAL TO REDUCE WAVEGUIDE LOSSES. WE HAVE FOUND THAT A PLATING BATH CAUSING HIGH STRESS IS SUITABLE TO FABRICATE LOW-LOSS WAVEGUIDES. IN ORDER TO INTEND FABRICATING WAVEGUIDES WITH MULTI-LAYERED DIELECTRICS, VACUUM EVAPORATION PROCESS OF DIELECTRIC MATERIALS IS ALSO TRIED.(1) ELECTRICALLY DEPOSITED GERMANIUM-COATED WAVEGUIDESTO FABRICATE GERMANIUM-COATED WAVEGUIDES WITH RELATIVELY LARGE DIAMETER, A TECHNIQUE OF ELECTRODEPOSITION OF GERMANIUM INSIDE A METALLIC PIPE IS DEVELOPED AND WAVEGUIDES WITH SMALL LOSSES ARE FABRICATED.(3) STUDY OF CHALCOGENIDE GLASSESTO FABRICATE DIELECTRIC-COATED HOLLOW WAVEGUIDES WITH RATHER LONG LENGTH BY A GLASS DRAWING TECHNIQUE, CHALCOGENIDE GLASS COMPOSED OF GERMANIUM AND SULFUR IS SYNTHESIZED BY USING A ROCKING FURNACE. WAVELENGTH DEPENDENCE OF THE REFRACTIVE INDICES AS WELL AS THE ABSORPTION COEFFICIENTS OF THE SYNTHESIZED GLASS MATHERIALS IS STUDIED.(4) ALUMINUM ANODIZING TECHNIQUEALUMINUM THIN FILM WAVEGUIDES HAVE BEEN FABRICATED BY USING ALUMINUM ANODIZING TECHNIQUE. DEPOSITION RATE OF THE THIN FILM IS FOUND TO BE VERY LARGE COMPARED WITH OTHER DEPOSITION TECHNIQUES.2. FABRICATION OF THIN FILM-COATED WAVEGUIDE <CO_2> LasersAS AN APPLICATION OF DIELECTRIC-COATED HOLLOW WAVEGUIDES, A NEW TYPE OF RF-EXCITED WAVEGUIDE <@c@o_2> LASER WITH A RECTANGULAR CROSS SECTION IS PROPOSED AND FABRICATED WHICH IS COMPOSED OF TWO DIELECTRIC OR LOSSY MATERIALS AND TWO METALLIC ELECTRODES WHICH ARE COATED BY A THIN FILM WITH SMALL ABSORPTIONS. IT IS FOUND THAT OUTPUT POWERS OF THE NEW WAVEGUIDE LASER ARE MUCH LARGER THAN THOSE OF CONVENTIONAL ONES.