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Study of Phase Changes and Physical Properties in Iron Nitride Films Prepared by Reactive Sputtering

反应溅射制备氮化铁薄膜的相变和物理性能研究

基本信息

批准号：
63460191
负责人：
NITTONO Osamu
金额：
$ 4.42万
依托单位：
Tokyo Institute of Technology, Faculty of Engineering
依托单位国家：
日本
项目类别：
Grant-in-Aid for General Scientific Research (B)
财政年份：
1988
资助国家：
日本
起止时间：
1988 至 1989
项目状态：
已结题

项目摘要

Iron nitride films are premising recording materials because of large saturation mangetization with a reasonable coercive force. In order to use these films as practical recording media, however, several problems including phase stability at elevated temperatures must be overcome. Therefore, in this study phase stability of iron nitride films subjected to elevated temperatures was examined together with phase or structural change taking place during heating process. Electric resistivity measurement of as-sputtered films was also done in order to evaluate a nature of film property, together with the measurement of magnetic property .(i.e.VSM curve). Main results are as follows:(1) Every iron nitride films were found to be prepared by controlling the ratio of nitrogen gas to argon gas, the substrate temperature, discharge voltage and discharge current. It was also found that as-deposited films prepared at elevated substrate temperatures showed very sharp X-ray peaks and consisted of stab … More le iron nitride films such as epsilon-, gamma'- and alpha- phases.(2) A structural change of as-deposited iron nitride films during heating process was investigated by in-situ electron microscopy observations: as-sputtered films contained a small amount of alpha-phase as locally distributed fine particles. Both nitrogen and iron atoms began to take place an site ordering with increasing temperature, and perfect ordered Fe_3N phase was realized during heating process. Two kinds of structural change from the epsilon phase to gamma' phase were observed for different heating rates: These features are well explained on the basis of both diffusion and shear displacement of nitrogen and iron atoms. Characteristics of VSM curves measured after various heating treatments were well explained by considering phase separation and precipitation occurred during heating process. Electric resistivity measurement of as-deposited films was done for various as-deposited iron films. It was found that as-deposited films prepared under higher sputtering gas pressures showed a slightly higher resistivity. This was well explained by considering that a qualitative change took place around grain boundaries formed in as-deposited films. The electric measurement of as-deposited films was found to be effective for evaluation of film property. Further detailed study is in progress. Less

氮化铁薄膜具有较高的饱和磁化率和较好的矫顽力，是一种优良的磁记录材料。然而，为了将这些膜用作实际的记录介质，必须克服几个问题，包括在高温下的相稳定性。因此，在这项研究中，相稳定性的氮化铁薄膜受到高温一起检查相或结构的变化发生在加热过程中。为了评价膜性质的性质，还进行了溅射膜的电阻率测量以及磁性质的测量。（即VSM曲线）。主要结果如下：（1）通过控制氮气与氩气的比例、衬底温度、放电电压和放电电流可以制备出各种氮化铁薄膜。研究还发现，在升高的衬底温度下制备的沉积膜显示出非常尖锐的X射线峰， ...更多信息即氮化铁膜，例如α-、γ-和α-相。(2)通过原位电子显微镜观察，研究了氮化铁薄膜在加热过程中的结构变化：溅射态薄膜中含有少量的α相，为局部分布的细小颗粒。随着温度的升高，氮原子和铁原子开始发生有序化，在加热过程中形成了完全有序的Fe_3N相。在不同的升温速率下，观察到了从γ相到γ '相的两种结构变化：根据氮和铁原子的扩散和剪切位移，很好地解释了这些特征。考虑到加热过程中发生的相分离和析出，很好地解释了不同热处理后测得的VSM曲线的特征。对不同沉积态的铁膜进行了电阻率测量。结果发现，在较高的溅射气体压力下制备的沉积膜表现出略高的电阻率。这是很好地解释，考虑到发生了质的变化，在沉积膜中形成的晶界周围。沉积态薄膜的电性能测试是评价薄膜性能的有效方法。进一步的详细研究正在进行中。少