Formation of Ceramic-Coated Materials by RF Sputtering Method and the Materials Evaluation using Molecule dynamics

射频溅射法陶瓷涂层材料的形成及分子动力学材料评价

• 批准号: 06650107
• 负责人: HOSHIDE Toshihiko
• 金额: $ 1.54万
• 依托单位: KYOTO UNIVERSITY
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for General Scientific Research (C)
• 财政年份: 1994
• 资助国家: 日本
• 起止时间: 1994 至 1995
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/en/grant/KAKENHI-PROJECT-06650107/
• 关键词: Ceramic thin film; Coated materials; Molecular dynamics; RF sputtering; Ultra-micro-hardness; Bending strength; Surface roughness; Coating condition

Sputtering process of ceramics on glass substrate and its evaluation based on molecule dynamics were investigated in this project.Thin films of alumina and silicon carbide were deposited on the substrate of borosilicate in an RF magnetron spattering apparatus. The hardness of the spattered films, as a tribological property, was evaluated by using an ultra-microscopic hardness testing machine. It was found that the hardness decreased with increasing RF output power in both ceramic films. Bending tests of coated materials, as a bulk strength property, was also carried out under 3-point bending. Some coated materials, especially under lower RF output power, showed lower strength than the glass substrate. In this situation, flaws which caused final fracture, were observed around the interface between coating film and substrate.A molecular dynamics approach was tried to estimate the internal stress field in sputtered film. A hard-sphere 3D model was adopted in the molecular dynamics of sputtered particles. Based on empirical information, cluster of sputtered particles was assumed to be larger with increasing RF output power. The experimental result was explained qualitatively by using the proposed analytical method.

本课题研究了玻璃基片上陶瓷的溅射过程及其分子动力学评价，利用射频磁控溅射装置在硼硅酸盐基片上沉积了氧化铝和碳化硅薄膜。溅射膜的硬度，作为摩擦学性能，通过使用超显微硬度试验机进行评价。结果发现，在两种陶瓷膜的硬度随RF输出功率的增加而降低。涂层材料的弯曲试验，作为体积强度性能，也进行了三点弯曲。一些涂层材料，特别是在较低的RF输出功率下，显示出比玻璃基板更低的强度。采用分子动力学方法对溅射薄膜内部的应力场进行了模拟计算。溅射粒子的分子动力学模型采用硬球三维模型。基于经验信息，溅射粒子的簇被假定为随着RF输出功率的增加而变大。利用所提出的分析方法对实验结果进行了定性解释。

项目成果

Toshihiko HOSHIDE,Kenji, HAYASHI,Takahiro SAITO,Kazumitsu KATSUKI and Tatsuo INOUE: "Mechanical Properties of Borosilicate Glass Coated with Alumina by Sputtering Process" Materials Science Research International. Vol.2, No.1. 33-38 (1996)

Toshihiko HOSHIDE、Kenji、HAYASHI、Takahiro SAITO、Kazumitsu KATSUKI 和 Tatsuo INOUE：“溅射工艺涂覆氧化铝的硼硅酸盐玻璃的机械性能”材料科学研究国际。

Toshihiko HOSHIDE: "Mechanical Properties of Borosilicate Glass Coated with Alumina by Sputtering Process" Materials Science Research International. 2. 33-38 (1996)

Toshihiko HOSHIDE：“通过溅射工艺涂覆氧化铝的硼硅酸盐玻璃的机械性能”材料科学研究国际。