Formation of Ceramic-Coated Materials by RF Sputtering Method and the Materials Evaluation using Molecule dynamics

本课题研究了陶瓷在玻璃基板上的溅射过程及其分子动力学评价。在射频磁控溅射装置中，在硼硅酸盐衬底上沉积了氧化铝和碳化硅薄膜。采用超显微硬度试验机对溅射膜的硬度进行了测试。结果表明，两种陶瓷膜的硬度均随射频输出功率的增大而减小。对包覆材料的整体强度进行了三点弯曲试验。一些涂层材料，特别是在较低的射频输出功率下，表现出比玻璃基板更低的强度。在这种情况下，在涂层与基体之间的界面周围观察到导致最终断裂的缺陷。本文尝试用分子动力学方法估计溅射薄膜内部应力场。溅射粒子的分子动力学采用硬球三维模型。根据经验信息，假设随着射频输出功率的增加，溅射颗粒团簇越大。用所提出的分析方法对实验结果进行了定性解释。

Sputtering process of ceramics on glass substrate and its evaluation based on molecule dynamics were investigated in this project.Thin films of alumina and silicon carbide were deposited on the substrate of borosilicate in an RF magnetron spattering apparatus. The hardness of the spattered films, as a tribological property, was evaluated by using an ultra-microscopic hardness testing machine. It was found that the hardness decreased with increasing RF output power in both ceramic films. Bending tests of coated materials, as a bulk strength property, was also carried out under 3-point bending. Some coated materials, especially under lower RF output power, showed lower strength than the glass substrate. In this situation, flaws which caused final fracture, were observed around the interface between coating film and substrate.A molecular dynamics approach was tried to estimate the internal stress field in sputtered film. A hard-sphere 3D model was adopted in the molecular dynamics of sputtered particles. Based on empirical information, cluster of sputtered particles was assumed to be larger with increasing RF output power. The experimental result was explained qualitatively by using the proposed analytical method.