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Processing and MD Analyses of Mechanical Properties of Ceramics Coated Materials

陶瓷涂层材料机械性能的加工和MD分析

基本信息

批准号：
09650101
负责人：
HOSHIDE Toshihiko
金额：
$ 1.86万
依托单位：
KYOTO UNIVERSITY
依托单位国家：
日本
项目类别：
Grant-in-Aid for Scientific Research (C)
财政年份：
1997
资助国家：
日本
起止时间：
1997 至 1998
项目状态：
已结题

项目摘要

A commercial borosilicate glass was coated with an alumina of 99.99% purity or a silicon carbide of 99.60% purity by an RF magnetron sputtering method under several conditions. In coating the silicon carbide successfully, the glass substrate was required to be pre-heated. Three-point bending tests of coated materials and the glass substrate were conducted under a constant stress rate. The strength of coated materials was improved in comparison with that of the glass substrate. However, no significant effect of the sputtering condition on the strength was identified in both coated materials. Although the strength of monolithic alumina was clarified to be less than that of monolithic silicon carbide, alumina coated materials were found to be stronger than silicon carbide coated materials in sputtering situations examined in this work. The aforementioned contradiction was attributed to a tensile thermal stress generated in silicon carbide coated materials which were processed by pre-heating substrate.The formation of amorphous ceramic film in sputtering process was simulated by using the dynamics of rigid spheres on the basis of some empirical facts. The structure of simulated film was investigated and a columnar structure associated with the shadowing effect was found to be formed. Simulated results showed that the volume fraction of deposited spheres defined for a simulated film increased as the sphere size is increased, According to an empirical fact, a larger sphere size was assumed to correspond to a higher RF output in sputtering. A larger value of the sphere volume fraction, implying a higher density, was supposed to correspond to a higher resistance to compressive deformation, i.e. a higher hardness. On the assumptions, the dependence of the sphere volume fraction on the sphere size was found to qualitatively agree with the dependence of the film hardness on the RF output as observed experimentally.

在几种条件下，通过RF磁控溅射法用纯度为99.99%的氧化铝或纯度为99.60%的碳化硅涂覆商业硼硅酸盐玻璃。在成功涂覆碳化硅的过程中，需要对玻璃基板进行预热。在恒定的应力速率下进行了涂覆材料和玻璃基板的三点弯曲测试。与玻璃基板相比，涂层材料的强度有所提高。然而，溅射条件对两种涂覆材料的强度没有显著影响。虽然单片氧化铝的强度被澄清为小于单片碳化硅，氧化铝涂层的材料被发现是强于碳化硅涂层的材料在溅射的情况下，在这项工作中检查。将上述矛盾归因于衬底预热处理后碳化硅涂层材料内部产生的热应力拉伸，并在一定的经验基础上，采用刚性球动力学方法模拟了溅射过程中非晶陶瓷膜的形成。对模拟薄膜的结构进行了研究，发现薄膜中形成了与遮蔽效应相关的柱状结构。模拟结果表明，模拟薄膜中沉积球的体积分数随着球尺寸的增大而增大，根据经验，球尺寸越大，溅射的射频输出越高。球体体积分数的较大值意味着较高的密度，被认为对应于较高的抗压缩变形性，即较高的硬度。的假设，球体体积分数的球体尺寸上的依赖关系被发现定性同意的膜硬度的RF输出的依赖关系，如实验所观察到的。