Formation and nano-scale characterization of ultrahigh-density nanodot superlattices
Formation and nano-scale characterization of ultrahigh-density nanodot superlattices
批准号:
15201023
负责人:
ICHIKAWA Masakazu
金额:
$31.45万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (A)
财政年份:
2003
资助国家:
日本
项目状态:
已结题
起止时间:
2003 至 2006
中文摘要
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英文摘要
Semiconductor nanostructures have attracted much interest due to their quantum-confinement effects, which can cause changes in material opto-electronic properties. We found that ultra-small Ge nanodots with the size of ~5 nm and ultra-high density of ~10^<12> cm^<-2> grew on Si surfaces covered with ultrathin SiO_2 films (~0.3nm thickness). Deposited Ge atoms on the surfaces reacted with the ultrathin SiO_2 films by the chemical reaction of SiO_2+Ge→SiO↑ + GeO↑ to form Ge nanodot nucleation sites. The following deposited Ge atoms were mainly captured by the nucleation sites due to the larger adsorption energy on the nucleation sites than that on the SiO_2 films. This resulted in Ge nanodot formation with ultra-small and uniform size and with ultra-high density. Ge nanodots had spherical shape which was different from that of the Ge island formed by the Stranski-Krastanov growth. Epitaxial or non-epitaxial Ge nanodots could be formed on the substrates by changing substrate temperatures … More during Ge deposition. The ultrathin SiO_2 technolgy could also been applied to form different kinds of nanostructures such as Si nanodots and β-FeSi_2 nanodots or nanoislands.We investigated electronic properties of individual Ge nanodots by scanning tunneling spectroscopy. With decreasing the dot size, the energy band gap of Ge nanodots increased to ~1.4 eV with the size change from 7 to 2 nm, which could be explained by the carrier quantum-confinement effect in Ge nanodots. We also observed the Coulomb-blockade effect featured by discrete tunneling current fluctuation on Ge nanodots at room temperature. The discrete fluctuation was explained by a single electron trap in a nanodot and a single electron escape into Si substrate. We further investigated the optical properties of the stacked structures in which Ge nanodots were embedded in Si films. Intense photoluminescence and electroluminescence were observed at photon energies around 0.8 eV (~1.5 μm) from the structures after high-temperature annealing. The photon energies around 0.8 eV are widely used for the optical communication.We also developed cathode-luminescence and electroluminescence systems using scanning tunneling microscopy to investigate optical properties of an individual nanodot. Less
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Formation of ultrahigh density Ge nanodots on oxidized Ge/Si (111) surface
氧化Ge/Si(111)表面超高密度Ge纳米点的形成
DOI:
--
发表时间:
2004
期刊:
Journal of Applied Physics 95
影响因子:
--
作者:
[Y.Nakamura, Y.Nagatomi, K.Sugie, N.Miyata, M.Ichikawa]
通讯作者:
M.Ichikawa
DOI:
10.1063/1.2189113
发表时间:
2006-03
期刊:
Applied Physics Letters
影响因子:
4
作者:
[A. Shklyaev;S. Nobuki;S. Uchida;Y. Nakamura;M. Ichikawa]
通讯作者:
A. Shklyaev;S. Nobuki;S. Uchida;Y. Nakamura;M. Ichikawa
"Single and highly dense germanium/silicon nanostructures",Handbook of semiconductor Nanostructures and Nanodevices, Vol. 1
“单一和高密度的锗/硅纳米结构”,半导体纳米结构和纳米器件手册,卷。
DOI:
--
发表时间:
2006
期刊:
影响因子:
--
作者:
[A.Shklyaev, M.Ichikawa]
通讯作者:
M.Ichikawa
Observation of the quantum-confinement effect in individual β-FeSi_2 nanoislands epitaxially grown on Si(111) surfaces using scanning tunneling spectroscopy
使用扫描隧道光谱观察在 Si(111) 表面外延生长的单个 β-FeSi_2 纳米岛的量子限制效应
DOI:
--
发表时间:
2006
期刊:
Applied Physics Letters 89
影响因子:
--
作者:
[Y.Nakamura, R.Suzuki, M.Umeno, S-P.Cho, S.Tanaka, M.Ichikawa]
通讯作者:
M.Ichikawa
Formation of ultrahigh density and ultrasmall coherent β-FeSi_2 nanodots on Si(111) substrates using Si and Fe codeposition method
Si和Fe共沉积法在Si(111)基底上形成超高密度超细相干β-FeSi_2纳米点
DOI:
--
发表时间:
2006
期刊:
Journal of Applied Physics 100
影响因子:
--
作者:
[Y.Nakamura, Y.Nagatomi, S-P.Cho, N.Tanaka, M.Ichikawa]
通讯作者:
M.Ichikawa
共 21 条
Development and Application of a thin film growth method called nano-channel hetero-epitaxy
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批准号:20360015
-
项目类别:Grant-in-Aid for Scientific Research (B)
-
资助金额:$11.98万
-
财政年份:2008
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负责人:ICHIKAWA Masakazu
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依托单位:
海外基金