Development of functional electrodes for dissociation of water molecules and its applications to the electrochemical machining procesges in ultrapure water
Development of functional electrodes for dissociation of water molecules and its applications to the electrochemical machining procesges in ultrapure water
批准号:
17206013
负责人:
GOTO Hidekazu
金额:
$31.03万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (A)
财政年份:
2005
资助国家:
日本
项目状态:
已结题
起止时间:
2005 至 2007
中文摘要
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英文摘要
Catalytic electrodes which can dissociate water molecules effectively were proposed and developed for ultraprecision electrochemical machining processes in ultrapure water. Surface carboxylated or sulfonated carbon polycrystalline electrodes were successfully prepared and etching rate of 8nm/s was obtained far etching of Cu polycrystalline surface using these surface modified electrodes. Especially, in the case of using the surface sulfonated carbon electrodes, ultra-smooth surfaces whose roughness are 4nm (Ra) were obtained with 100% current efficiency. On the other hand, for the etching processes of cathode metal or semi-conductor, we used aminated gold electrodes, and etching rates of 0.2nm/s were obtained for the cathode AL. Applying these results, a new ultraprecision machining method in which using surface modified fine-particles dispersed in ultrapure water were proposed and tested. Surface aminated ultrafine particle whose diameters are 30nm were dispersed in ultrapure water and using dialysis the density of impurity of metal ions were lowered to ppb level. By using this new "electrolyte", we performed ultraclean electrochemical etching process of Si surfaces. The observed surface roughness for (001) and (111) surfaces were 0.1228nm (Ra) and 0.064nm (Ra), respectively. Finally, the present new electrochemical machining processes were applied to transcription of the geometry of electrodes to Cu, Al and W surfaces. In the case of using fine-particles whose diameters are 5mm, the transcriptions were successfully achieved.
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Electron Transport Simulations of a Multilead System Using the Impulse Rdsponse Method
使用脉冲 Rdsponse 方法对多引线系统进行电子传输仿真
DOI:
--
发表时间:
2008
期刊:
Surface and Interface Analysis (in press)
影响因子:
--
作者:
[T., Suzuki, H., Goto, K., Hirose]
通讯作者:
Hirose
Fabrication of flat silicon surface using eco-friendly electrochemical etching process on cathode
采用阴极电化学蚀刻工艺制备平坦硅表面
DOI:
--
发表时间:
2006
期刊:
影响因子:
--
作者:
[T., Suzuki, H., Goto, K., Hirose, Y. Ichii and H. Goto]
通讯作者:
Y. Ichii and H. Goto
超純水のみによる電気化学的加工法の研究-加工中に生成するOHラジカルの測定-
仅使用超纯水的电化学加工研究-加工过程中产生的OH自由基的测定-
DOI:
--
发表时间:
2005
期刊:
影响因子:
--
作者:
[八木 圭太, 一井愛雄, 森勇蔵, 広瀬喜久治, 遠藤勝義, 後藤英和]
通讯作者:
後藤英和
基板表面の加工方法
基材表面处理方法
DOI:
--
发表时间:
2006
期刊:
影响因子:
--
作者:
[]
通讯作者:
First-Principles Molecular-Dynamics Simulations of Organic Molecule Dissociation Process by OH
OH 有机分子解离过程的第一性原理分子动力学模拟
DOI:
--
发表时间:
2005
期刊:
影响因子:
--
作者:
[T. Kimura, S. Kakeya, K. Yagi, Y. Ichii, K. Inagaki, K. Endo, K. Hirose and H. Goto]
通讯作者:
K. Hirose and H. Goto
共 22 条
Design of nano-scale electrodes and its applications to electrochemical processing
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批准号:21360063
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项目类别:Grant-in-Aid for Scientific Research (B)
-
资助金额:$11.32万
-
财政年份:2009
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负责人:GOTO Hidekazu
-
依托单位:
DEVELOPMENT OF ULTRAPRECISION CLEANING SYSTEM USING HIGH-VELOCITY SHEAR FLOW AND ELECTROCHEMICAL ETCHING PROCESS IN ULTRAPRE WATER
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批准号:14205025
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项目类别:Grant-in-Aid for Scientific Research (A)
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资助金额:$29.04万
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财政年份:2002
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负责人:GOTO Hidekazu
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依托单位:
First-Principles Molecular-Dynamics Simulations of Electrochemical Machining in Ultrapure Water
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批准号:13650117
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项目类别:Grant-in-Aid for Scientific Research (C)
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资助金额:$1.79万
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财政年份:2001
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负责人:GOTO Hidekazu
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依托单位:
海外基金