Sublattice Engineering of Environmentally-Friendly Thermoelectric Silicide Semiconductors
Sublattice Engineering of Environmentally-Friendly Thermoelectric Silicide Semiconductors
批准号:
18206074
负责人:
INUI Haruyuki
金额:
$32.12万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (A)
财政年份:
2006
资助国家:
日本
项目状态:
已结题
起止时间:
2006 至 2008
中文摘要
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英文摘要
Re, Ruのシリサイドに注目して, これらシリサイドのシリコン副格子(サブラティス)の配列の多様性に基づいた特異な微細組織を制御して, その特性改善および新たな物質探索, 特性向上の指導原理の確立を目指した.「金属副格子を一定に保つことによって電気伝導を低減することなく, Si副格子のナノ・スケール変調から生じる相界面により熱伝導を低減する」サブラティス・エンジニアリングがこれらの目的に有用であることを明らかにした.
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Ru_2Si_3基チムニーラダー相の構造変化と熱電特性
Ru_2Si_3基梯形烟囱相的结构变化及热电性能
DOI:
--
发表时间:
2007
期刊:
影响因子:
--
作者:
[小山達也, 田俊太, 石田央, 岸田恭輔, 田中克志, 乾晴行]
通讯作者:
乾晴行
空孔規則配列相を有するReSil. 75基シリサイドの熱電特性
具有空位有序相的ReSil 75族硅化物的热电性能。
DOI:
--
发表时间:
2008
期刊:
影响因子:
--
作者:
[H. Kokawa, W.Z. Jin, Z.J. Wang, M. Michiuchi, Y.S. Sato, W. Dong, and Y. Katada, Widiyastuti, 乾晴行, 乾晴行]
通讯作者:
乾晴行
Thermoelectric Properties of Ternary and Al Substituted Ru1-xRexSiy Chimney-Ladder Compounds
三元和 Al 取代的 Ru1-xRexSiy 烟囱梯化合物的热电性能
DOI:
--
发表时间:
2009
期刊:
Acta Materialia
影响因子:
9.4
作者:
[K. Kishida, A. Ishida, T. Koyama, S. Harada, N. L. Okamoto, K. Tanaka and H. Inui]
通讯作者:
K. Tanaka and H. Inui
Defect Generation in Some Transition-Metal Silicides to Accommodate the Deviation from the Stoichiometric Compositions
一些过渡金属硅化物中缺陷的产生以适应化学计量成分的偏差
DOI:
--
发表时间:
2007
期刊:
影响因子:
--
作者:
[H. Inui, K. Kishida, A. Ishida, S. Harada,]
通讯作者:
S. Harada,
Defect Generation in Some Transition-Metal Silicides in Accomodating the Deviation from the Stoichiometric Compositions
一些过渡金属硅化物在适应化学计量组成偏差时产生的缺陷
DOI:
--
发表时间:
2007
期刊:
影响因子:
--
作者:
[H. Inui, K. Tanaka, K. Kishida and S. Harada]
通讯作者:
K. Kishida and S. Harada
共 22 条
Materials science and engineering of hydrogen-induced shear transformation in hydrogen absorbing materials
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批准号:25630304
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项目类别:Grant-in-Aid for Challenging Exploratory Research
-
资助金额:$2.58万
-
财政年份:2013
-
负责人:INUI Haruyuki
-
依托单位:
Materials science and engineering of hydrogen-induced shear transformation in hydrogen absorbing materials
-
批准号:24656409
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项目类别:Grant-in-Aid for Challenging Exploratory Research
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资助金额:$2.58万
-
财政年份:2012
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负责人:INUI Haruyuki
-
依托单位:
Intrinsic Deformation Resistance of Interface. New Interface Structure Properties Deduced by Micropillar Deformation
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批准号:23656429
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项目类别:Grant-in-Aid for Challenging Exploratory Research
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资助金额:$2.66万
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财政年份:2011
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负责人:INUI Haruyuki
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依托单位:
Multimorphism observed in peculiar silicide semiconductors and its applications to materials science
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批准号:21246101
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项目类别:Grant-in-Aid for Scientific Research (A)
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资助金额:$29.95万
-
财政年份:2009
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负责人:INUI Haruyuki
-
依托单位:
Development of new nano-electron diffraction method for identification of crystal chirality and polarity
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批准号:16360346
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项目类别:Grant-in-Aid for Scientific Research (B)
-
资助金额:$9.73万
-
财政年份:2004
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负责人:INUI Haruyuki
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依托单位:
New thermoelectric materials with high performance (ZT>l)-Re silicide 4
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批准号:14350369
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$10.94万
-
财政年份:2002
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负责人:INUI Haruyuki
-
依托单位:
Mechanisms of hydride formation in hydrogen-absorbing alloys - with special attention to introduction of lattice defects -
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批准号:12450282
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项目类别:Grant-in-Aid for Scientific Research (B)
-
资助金额:$10.5万
-
财政年份:2000
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负责人:INUI Haruyuki
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依托单位:
Grain boundaries and deformation in two-phase TiAl alloys-Approach with bi-PST TiAl-
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批准号:09450261
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$6.4万
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财政年份:1997
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负责人:INUI Haruyuki
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依托单位:
Synthesis of large beta-SiC single crystals by 'silicide-flux'method
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批准号:09555211
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$7.23万
-
财政年份:1997
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负责人:INUI Haruyuki
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依托单位:
Compositional inhomogenuity and mechanical properties of gamma/gamma interfaces in two-phase TiAl alloys
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批准号:07650818
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项目类别:Grant-in-Aid for Scientific Research (C)
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资助金额:$1.6万
-
财政年份:1995
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负责人:INUI Haruyuki
-
依托单位:
Structural Analysis of diffuse scattering appeared in high-purity TiAl alloys
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批准号:05650619
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项目类别:Grant-in-Aid for General Scientific Research (C)
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资助金额:$1.54万
-
财政年份:1993
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负责人:INUI Haruyuki
-
依托单位:
海外基金