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Preparation and characterization of high quality bismuth ferrite based thin films-for improvement of piezoelectric and insulating properties-

Preparation and characterization of high quality bismuth ferrite based thin films-for improvement of piezoelectric and insulating properties-
高质量铁氧体铋基薄膜的制备和表征-用于改善压电和绝缘性能-
批准号:
21860069
负责人:
NAKASHIMA Seiji
金额:
$1.71万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Research Activity Start-up
财政年份:
2009
资助国家:
日本
项目状态:
已结题
起止时间:
2009 至 2010

项目摘要

项目成果

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相关文献

中文摘要
翻译
通过原位观察电场作用下BiFeO_3 (BFO)薄膜的晶体结构变形,精确地研究了BFO薄膜的逆压电性能。此外,还首次采用离子束溅射工艺制备了高质量的BFO薄膜,并在室温下成功获得了铁电滞回线。此外,还获得了第一原理计算所期望的具有优异铁电性能的大c/a比BFO相。
英文摘要
Inverse piezoelectric properties of BiFeO_3 (BFO) thin films have been precisely investigated by in-situ observation of crystal structural deformation under an electric field. Moreover, ion beam sputtering process has been employed for high quality BFO thin film deposition for the first time, and ferroelectric hysteresis loops have been successfully obtained at RT. Furthermore, large c/a ratio BFO phase which is expected excellent ferroelectric properties by the first-principle calculation has also obtained.
期刊论文(22)
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会议论文
DOI: 10.1016/j.cap.2010.11.066
发表时间: 2011-05
期刊: Current Applied Physics
影响因子: 2.4
作者: [S. Nakashima;Y. Tsujita;H. Fujisawa;J. Park;T. Kanashima;M. Okuyama;M. Shimizu]
通讯作者: S. Nakashima;Y. Tsujita;H. Fujisawa;J. Park;T. Kanashima;M. Okuyama;M. Shimizu
DOI: --
发表时间: 2011
期刊: J.Kor.Phys.Soc.
影响因子: --
作者: [S.Nakashima, H.Fujisawa, et al.]
通讯作者: et al.
DOI: --
发表时间: 2011
期刊:
影响因子: --
作者: [中嶋誠二, 藤沢浩訓, 他]
通讯作者:
DOI: --
发表时间: 2009
期刊:
影响因子: --
作者: [S.K.Sahari, H.Murakami, T.Fujioka, T.Bando, A.Ohta, K.Makihara, S.Higashi, S.Miyazaki, 中嶋誠二]
通讯作者: 中嶋誠二
18
    Investigation of new-domain-structure-induced functionalities in BiFeO_3 thin films.
    • 批准号:
      23760290
    • 项目类别:
      Grant-in-Aid for Young Scientists (B)
    • 资助金额:
      $2.66万
    • 财政年份:
      2011
    • 负责人:
      NAKASHIMA Seiji
    • 依托单位:
    海外基金