Preparation and characterization of high quality bismuth ferrite based thin films-for improvement of piezoelectric and insulating properties-
Preparation and characterization of high quality bismuth ferrite based thin films-for improvement of piezoelectric and insulating properties-
批准号:
21860069
负责人:
NAKASHIMA Seiji
金额:
$1.71万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Research Activity Start-up
财政年份:
2009
资助国家:
日本
项目状态:
已结题
起止时间:
2009 至 2010
中文摘要
通过原位观察电场作用下BiFeO_3 (BFO)薄膜的晶体结构变形,精确地研究了BFO薄膜的逆压电性能。此外,还首次采用离子束溅射工艺制备了高质量的BFO薄膜,并在室温下成功获得了铁电滞回线。此外,还获得了第一原理计算所期望的具有优异铁电性能的大c/a比BFO相。
英文摘要
Inverse piezoelectric properties of BiFeO_3 (BFO) thin films have been precisely investigated by in-situ observation of crystal structural deformation under an electric field. Moreover, ion beam sputtering process has been employed for high quality BFO thin film deposition for the first time, and ferroelectric hysteresis loops have been successfully obtained at RT. Furthermore, large c/a ratio BFO phase which is expected excellent ferroelectric properties by the first-principle calculation has also obtained.
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DOI:
10.1016/j.cap.2010.11.066
发表时间:
2011-05
期刊:
Current Applied Physics
影响因子:
2.4
作者:
[S. Nakashima;Y. Tsujita;H. Fujisawa;J. Park;T. Kanashima;M. Okuyama;M. Shimizu]
通讯作者:
S. Nakashima;Y. Tsujita;H. Fujisawa;J. Park;T. Kanashima;M. Okuyama;M. Shimizu
X-ray Diffraction Study of Electric-field-induced Strains in Polycrystalline BiFeO_<3> Thin Films at Low Temperature Using Synchrotron Radiation
利用同步辐射的X射线衍射研究低温多晶BiFeO_<3>薄膜中电场引起的应变
DOI:
--
发表时间:
2011
期刊:
J.Kor.Phys.Soc.
影响因子:
--
作者:
[S.Nakashima, H.Fujisawa, et al.]
通讯作者:
et al.
デュアルイオンビームスパッタ法を用いたBiFeO3薄膜の作製
双离子束溅射法制备BiFeO3薄膜
DOI:
--
发表时间:
2011
期刊:
影响因子:
--
作者:
[中嶋誠二, 藤沢浩訓, 他]
通讯作者:
他
BiFeO_3薄膜におけるリーク電流の面内マッピング
BiFeO_3 薄膜漏电流的面内测绘
DOI:
--
发表时间:
2009
期刊:
影响因子:
--
作者:
[S.K.Sahari, H.Murakami, T.Fujioka, T.Bando, A.Ohta, K.Makihara, S.Higashi, S.Miyazaki, 中嶋誠二]
通讯作者:
中嶋誠二
Characterization of Bismuth Ferrite Thin Films with Large c/a Axial Ratio Prepared by Ion Beam Sputtering
离子束溅射制备大c/a轴比铁氧体铋薄膜的表征
DOI:
--
发表时间:
2010
期刊:
影响因子:
--
作者:
[S.Nakashima, H.Fujisawa, et al.]
通讯作者:
et al.
共 18 条
Investigation of new-domain-structure-induced functionalities in BiFeO_3 thin films.
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批准号:23760290
-
项目类别:Grant-in-Aid for Young Scientists (B)
-
资助金额:$2.66万
-
财政年份:2011
-
负责人:NAKASHIMA Seiji
-
依托单位:
海外基金