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Laser-stimulated reactive atmospheric pressure plasma jet etching processes for ultra-precision processing of optical glasses (LasPlasJet)

Laser-stimulated reactive atmospheric pressure plasma jet etching processes for ultra-precision processing of optical glasses (LasPlasJet)
用于光学玻璃超精密加工的激光刺激反应大气压等离子体喷射蚀刻工艺 (LasPlasJet)
批准号:
453925455
负责人:
Professor Dr. Thomas Arnold
金额:
$0.0万
依托单位国家:
德国
项目类别:
Research Grants
财政年份:
--
资助国家:
德国
项目状态:
未结题
起止时间:

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中文摘要
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英文摘要
Ultra-precision shape generation and correction of optical surfaces such as lenses or mirrors by means of locally acting fluorine-containing atmospheric pressure plasma jets is based on a dry etching process and involves chemical reactions between the reactive species (fluorine radicals) formed in the plasma and the atoms of the substrate surface forming volatile products for simple silicon compounds, e.g. Si, SiO2, SiC. However, optical glasses considered in the project additionally contain metal oxides, which also form non-volatile reaction products during plasma jet etching, so that a uniform, temporally constant and roughness maintaining material removal cannot be achieved. Therefore, the research project aims at the experimental investigation of the physical and chemical interaction processes during the combination of pulsed reactive atmospheric pressure plasma jets and laser radiation in an etching process. The fundamental challenge of the topic is the determined influence on plasma jet based etching processes of composite, silicon based glasses by the application of a further, independently adjustable radiation energy, i.e. laser, which acts simultaneously or sequentially before or after the plasma jet etching. When plasma jet and laser radiation are combined, the additional initiation of chemical-physical processes in plasma jet etching can influence the material composition or structure in the near-surface area, so that an influence on the selectivity, homogeneity and the temporal and spatial constancy of the etch removal is expected. The main objective of the project is to gain a deeper scientific understanding of the mechanisms and processes involved in the combination of plasma jet and laser irradiation during the etching of complex glass materials. In the following, the gained knowledge will be used as a basis for the planned development of plasma jet / laser ultra-precision processing methods of glasses for high-end optical applications.
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Enhancement of diamond machined RSA-Al501 surfaces for optical applications by process integrated Ion Beam Etching
  • 批准号:
    452333040
  • 项目类别:
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  • 资助金额:
    $0.0万
  • 财政年份:
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  • 负责人:
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  • 依托单位:
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  • 批准号:
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  • 项目类别:
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  • 资助金额:
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