Laser-stimulated reactive atmospheric pressure plasma jet etching processes for ultra-precision processing of optical glasses (LasPlasJet)

用于光学玻璃超精密加工的激光刺激反应大气压等离子体喷射蚀刻工艺 (LasPlasJet)

• 批准号: 453925455
• 负责人: Professor Dr. Thomas Arnold
• 金额: --
• 依托单位: Leibniz-Institut für Oberflächenmodifizierung e.V. (IOM)
• 依托单位国家: 德国
• 项目类别: Research Grants
• 资助国家: 德国
• 项目状态: 未结题
• 来源: https://gepris.dfg.de/gepris/projekt/453925455?language=en
• 关键词: Laser; stimulated; reactive; atmospheric; pressure

Ultra-precision shape generation and correction of optical surfaces such as lenses or mirrors by means of locally acting fluorine-containing atmospheric pressure plasma jets is based on a dry etching process and involves chemical reactions between the reactive species (fluorine radicals) formed in the plasma and the atoms of the substrate surface forming volatile products for simple silicon compounds, e.g. Si, SiO2, SiC. However, optical glasses considered in the project additionally contain metal oxides, which also form non-volatile reaction products during plasma jet etching, so that a uniform, temporally constant and roughness maintaining material removal cannot be achieved. Therefore, the research project aims at the experimental investigation of the physical and chemical interaction processes during the combination of pulsed reactive atmospheric pressure plasma jets and laser radiation in an etching process. The fundamental challenge of the topic is the determined influence on plasma jet based etching processes of composite, silicon based glasses by the application of a further, independently adjustable radiation energy, i.e. laser, which acts simultaneously or sequentially before or after the plasma jet etching. When plasma jet and laser radiation are combined, the additional initiation of chemical-physical processes in plasma jet etching can influence the material composition or structure in the near-surface area, so that an influence on the selectivity, homogeneity and the temporal and spatial constancy of the etch removal is expected. The main objective of the project is to gain a deeper scientific understanding of the mechanisms and processes involved in the combination of plasma jet and laser irradiation during the etching of complex glass materials. In the following, the gained knowledge will be used as a basis for the planned development of plasma jet / laser ultra-precision processing methods of glasses for high-end optical applications.

通过局部作用的含氟大气压等离子体射流对光学表面（例如透镜或镜子）进行超精密形状生成和校正是基于干法蚀刻工艺，涉及等离子体中形成的活性物质（氟自由基）与基底表面原子之间的化学反应，形成简单硅化合物的挥发性产物，例如硅化合物。硅、二氧化硅、碳化硅。然而，该项目中考虑的光学玻璃还含有金属氧化物，这些金属氧化物在等离子喷射蚀刻过程中也会形成非挥发性反应产物，因此无法实现均匀、时间恒定且保持粗糙度的材料去除。因此，该研究项目旨在对蚀刻过程中脉冲反应大气压等离子体射流和激光辐射相结合期间的物理和化学相互作用过程进行实验研究。该主题的基本挑战是通过应用进一步的、独立可调的辐射能量（即激光）对基于等离子射流的复合硅基玻璃蚀刻工艺的确定影响，该辐射能量在等离子射流蚀刻之前或之后同时或顺序作用。当等离子射流和激光辐射相结合时，等离子射流蚀刻中额外引发的化学物理过程可以影响近表面区域的材料成分或结构，从而对蚀刻去除的选择性、均匀性以及时间和空间稳定性产生影响。该项目的主要目标是更深入地科学了解复杂玻璃材料蚀刻过程中等离子射流和激光照射相结合所涉及的机制和过程。接下来，所获得的知识将作为计划开发用于高端光学应用的等离子喷射/激光超精密玻璃加工方法的基础。