SYNERGY OF CERAMIC FILM AND PLASTIC SUBSTRATE

常压化学气相沉积（CVD）法制备的金属羟基结构与so-gel法制备的干燥凝胶体结构相似，只是存在烷基基。在本研究中，进行了扩展实验，以获得塑料衬底上的结晶金属氧化物薄膜。在相对较低的温度下，在硅、硅玻璃、PET和聚酰亚胺上制备了金属羟基薄膜。这些薄膜在相对较低的温度下退火形成无裂纹的结晶薄膜。采用红外吸收光谱法、x射线衍射法、扫描电镜、差示扫描量热法测定样品的结晶行为。首先，在基片温度为120℃~ 360℃，气相温度低于300℃的条件下，采用常压CVD装置合成非晶羟基钛薄膜。然后在低于500℃的温度下处理样品。虽然样品是在相对较低的衬底温度下制备的(例如：200°C)结晶开始时的退火温度相对较低，样品在相对较高的衬底温度(例如；280℃)结晶开始时退火温度相对较高。为了在塑料基体上获得无裂纹后退火结晶涂层，需要具有大自由体积的非晶态金属羟基薄膜。

The structure of metal-hydroxyls fabricated using atmospheric chemical vapor deposition(CVD)is thought to be similar to that of dried gel bulks fabricated using so-gel method, except existence of alkyl base. In this study, the extended experiment was performed to obtain crystalline metal-oxide films on the plastic substrate. The metal-hydroxyl films were fabricated on the Si, silica glass, PET and polyimides at relatively low temperature. These films were annealed to form crack-free crystalline films at relatively low temperature. The behavior of crystallization of the sample was determined using infrared absorption spectroscopy, X-ray diffractometry, scanning electron microscopy, differential scanning calorimetry. First of all, the amorphous titanium hydroxyl films were synthesized by an atmospheric CVD apparatus at the substrate temperature of 120°C-360°C and the gas temperature below 300°C.Then the samples were treated at the temperatures below 500°C.Although the sample fabricated at relatively low substrate temperatures(e.g.200°C)crystallization begins relatively low annealing temperature, the sample fabricated at relatively high substrate temperatures(e.g.280°C)crystallization begins relatively high annealing temperature. In obtaining crystalline coating on the plastic substrate by post-annealing without cracks, amorphous metal-hydroxyl films with large free-volume are needed.