Microarchitecture of ceramic films

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A chemical vapor deposition (CVD) operated under atmospheric pressure enables to control formation of the microstructure of the ceramic films. For example, whisker structure and mesh structure controlled at micrometer size are formed. This technique is defined as microarchitecture of the ceramic films. Using microarchitecture, field emission devices, structural materials, optical devices are able to be designed. In this project, unique properties and structures were proposed.(1) Manufacture of ZnO, MgO, Y2O3 whiskersManufacture of ZnO, MgO, Y2O3 whiskers were established.(2) MgO/ZnO heterowhiskersMgO whiskers were epitaxially deposited on the ZnO whiskers. X-ray diffractometry revealed that all crystalline directions were aligned between ZnO and MgO whiskers.(3) Phosphor whiskersPhoto-luminescence intensity of Y2O3: RE (RE= Eu, Tb, Tm) whiskers was stronger than that of powder of Y203:RE(4) Field emissionZnO:Al conductive whiskers showed relatively strong field emission properties.(5) Mechanical properties of ZnO:Al conductive whiskersMechanical strength of the ZnO:Al was dependent upon the dose of Al. Although the strength was extremely low at the Al concentration of 0.2〜1.0 at%, it became strong over 1.0 at%.