Study on New Semiconductors for Temperature-insensitive Wavelength Semiconductor Lasers
Study on New Semiconductors for Temperature-insensitive Wavelength Semiconductor Lasers
批准号:
11555087
负责人:
OE Kunishige
金额:
$8.77万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (B)
财政年份:
1999
资助国家:
日本
项目状态:
已结题
起止时间:
1999 至 2001
中文摘要
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英文摘要
A new semiconductor material consisting of semiconductor and semimetal which has a temperature-insensitive band gap has been studied to develop a semiconductor laser whose wavelength does not change when the ambient temperature Changes. The detailed growth conditions and the characteristics of GaAs_<1-x>Bi_x semiconductor alloy layers have been studied. The lattice constants of the alloy were found to increase with the addition of Bi. The uniformity and the reproducibility of the solid composition of the GaAs_<1-x>Bi_x epilayers are good in spite of the difficulty of epitaxial growth. Although layer growth was performed at a low temperature, the stability of GaAs_<1-x>Bi_x alloy was sufficient for device processing. The photoluminescence (PL) spectra show that the PL peak energy of the GaAs_<1-x>Bi_x alloy shifts to a longer wavelength with increasing Bi content. The temperature dependence of the PL peak energy is much weaker than the temperature variation of the band gap of GaAs. The results obtained in this research support the hypothesis that III-V alloy semiconductors consisting of semiconductor and semimetal components have a temperature-insensitive band gap.To create a semiconductor material of optical fiber communication wavelength, GaInAsBi alloy has been targetted. The epitaxial growth of GaInAs, the host crystal of the alloy, was examined at low temperatures. Using new method, GaInAs layers of good optical quality were grown even at 420 C. However the growth temperature could not be lowered any further even using a new Ga precursor, TiPGa. New precursors of Ga and In which enable the growth of GaInAs at 365 C are expected, which will allow the growth of the new GaInAsBi alloy.
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K.Oe: "Characteristics of Semiconductor Alloy GaAsBi"Jpn. J. Appl. Phys.. (印刷中).
K.Oe:“半导体合金 GaAsBi 的特性”J. Appl.(出版中)。
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H.OFUCHI, T.KUBO, M.TABUCHI, Y.TAKEDA, H.OKAMOTO, and R.OE: "Fluorescence EXAFS study on local structures around Bi atoms in InAsBi grown by low-pressure MOVPE"Jpn. J. Appl. Phys.. Vol. 38, Suppl. 38-1. 545-547 (1999)
H.OFUCHI、T.KUBO、M.TABUCHI、Y.TAKEDA、H.OKAMOTO 和 R.OE:“低压 MOVPE 生长的 InAsBi 中 Bi 原子周围局部结构的荧光 EXAFS 研究”Jpn。
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K.Oe: "Metalorganic Vapor Phase Epitaxial Growth of Metastable GaAs_<1->Bix Alloy"J. Crystal Growth. (印刷中).
K.Oe:“亚稳态 GaAs_<1->Bix 合金的金属有机气相外延生长”J。
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K. OE: "Metalorganic Vapor Phase Epitaxial Growth of Metastable GaAsBi Alloy"Abstract of 13th International Conference on InP and Related Materials, Nara, May. 227 (2001)
K. OE:“亚稳态 GaAsBi 合金的金属有机气相外延生长”第 13 届 InP 及相关材料国际会议摘要,奈良,5 月。
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R VERMA, M. HERMS, ,G. IRMER, M. YAMADA, H. OKAMOTO, and K. OE: "Raman Probe of New Laser Materials GaAs_<1-x>Bi_x and InAs_<1-x>Bi_x"Proceedings of SPIE. Vol. 3945. 168-173 (2000)
R VERMA,M. HERMS,,G。
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共 38 条
Research on GaInAAs semiconductor alloy for temperature-insensitive wavelength semiconductor lasers
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批准号:17360140
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$9.47万
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财政年份:2005
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负责人:OE Kunishige
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依托单位:
Study on (110)-QW Lasers with Low Threshold Current Density
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批准号:11650346
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项目类别:Grant-in-Aid for Scientific Research (C)
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资助金额:$0.64万
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财政年份:1999
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负责人:OE Kunishige
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依托单位: