Vertical-scanning profilometry having nanometric height resolution and high scanning speed using two short-coherent-light sources of different wavelengths

使用两个不同波长的短相干光源，具有纳米级高度分辨率和高扫描速度的垂直扫描轮廓测定法

• 批准号: 14350129
• 负责人: ADACHI Masaaki
• 金额: $ 9.6万
• 依托单位: KANAZAWA UNIVERSITY
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (B)
• 财政年份: 2002
• 资助国家: 日本
• 起止时间: 2002 至 2004
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/en/grant/KAKENHI-PROJECT-14350129/
• 关键词: two wavelengths; optical interferometer; interference phase; vertical scanning; phase shift; flash lamp; Extremely high power LED; Digital camera; 二重露光

We developed a high-speed vertical scanning profilometry which has nanometric height resolution. The developed profilometry is equipped with two short-coherent-light sources. These sources are made with two types of band-path filter and extremely high power light emitting diodes (LED). In 3-D profile measurements, this profilometry records many interferograms while vertically-scanning the Mirou-type objective with 0.4-micrometers step and alternately-flashing LED. Odd-numbered interferograms are captured with 503-nm LED and even-numbered interferograms are with 591-nm LED. Regarding the recorded interferograms, a computer extracts phase and modulation amplitude using phase-shifting technique. As two step movements are put between the sequential captures with the same LED, phase step corresponds to approximately 6π+π/2 with 503 nm and approximately 6π-π/2 with 591 nm.After searching the interferogram having modulation peak, the computer extracts optical path difference at the capturing moment of the interferogram with nanometric resolution from phase information.From 0.4 μm of the vertical step length and capturing rate more than 110 Hz, vertical scanning speed is given more than 46 μm/s. This speed is four times higher than commercial high-speed vertical scanning profilometry

我们开发了一种高速垂直扫描轮廓术，具有纳米级的高度分辨率。所开发的轮廓术配备了两个短相干光源。这些光源由两种类型的带路滤波器和极高功率发光二极管（LED）制成。在三维轮廓测量中，该轮廓测量法记录了许多干涉图，同时以0.4微米步进和交替闪烁LED垂直扫描mirou型物镜。奇数干涉图用503纳米的LED捕获，偶数干涉图用591纳米的LED捕获。对记录的干涉图，计算机采用移相技术提取相位并调制幅值。由于在同一LED的连续捕获之间放置两个步进运动，相位步进对应于503 nm的约6π+π/2和591 nm的约6π-π/2。计算机在搜索具有调制峰的干涉图后，从相位信息中提取出纳米分辨率的干涉图捕获时刻的光程差。在垂直步长为0.4 μm，捕获速率大于110 Hz的范围内，垂直扫描速度大于46 μm/s。这个速度是商用高速垂直扫描轮廓术的四倍

项目成果

Vertical-scanning profilometry using double-exposure camera and two short-coherent-light sources of different wavelengths

使用双曝光相机和两个不同波长的短相干光源的垂直扫描轮廓测量

• 发表时间: 2002
• 期刊: Proceedings of SPIE, Optomechatronic Systems III 4902
• 作者: M.Adachi;K.Inabe
• 通讯作者: K.Inabe

High-speed precision-surface profilometry using large phase shifting

使用大相移的高速精密表面轮廓测量

• 发表时间: 2003
• 期刊: Proceedings of SPIE, Optomechatronic Systems IV 5264
• 作者: M.Adachi;K.Ueda
• 通讯作者: K.Ueda

Vertical-scanning profilometry having nanometric height resolution and scanning speed more than 40μm/s

垂直扫描轮廓仪，具有纳米级高度分辨率，扫描速度超过40μm/s

• 发表时间: 2004
• 期刊: Proceedings of SPIE, Optoinechatronic Sensors, Actuators, and Control 5602
• 作者: Masaaki Adachi

Masaaki Adachi, Katsuyuki Inabe: "Vertical-scanning profilometry using double-exposure camera and two short-coherent-light sources of different wavelengths"Proceedings of SPIE "Optomechatronic Systems III". 4902. 600-607 (2002)

Masaaki Adachi、Katsuyuki Inabe：“使用双曝光相机和两个不同波长的短相干光源的垂直扫描轮廓测量”SPIE“Optomechatronic Systems III”论文集。

Masaaki Adachi, Kakuji Ueda: "Hight-speed precision-surface profilometry using large phase shifting"Proceedings of SPIE "Optomechatronic Systems IV". 5264. 322-331 (2003)

Masaaki Adachi、Kakuji Ueda：“使用大相移的高速精密表面轮廓测量”SPIE“Optomechatronic Systems IV”论文集。