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Research on a functional inverter discharge plasma and a deposition of low frictional thin films for metal mechanical parts

功能性逆变放电等离子体及金属机械零件低摩擦薄膜沉积研究

基本信息

批准号：
11558053
负责人：
GOTO Seiichi
金额：
$ 5.95万
依托单位：
Osaka University
依托单位国家：
日本
项目类别：
Grant-in-Aid for Scientific Research (B).
财政年份：
1999
资助国家：
日本
起止时间：
1999 至 2000
项目状态：
已结题

来源：
https://kaken.nii.ac.jp/en/grant/KAKENHI-PROJECT-11558053/
关键词：
surface treatment process plasma low friction film inverter diamond thin films tribology pulsed glow plasma ion assist ダイヤモンド薄膜イオンアシスト

项目摘要

An inverter-direct-driving technique has been introduced to a dc glow discharge system in a middle background pressure resion (10^1〜10^3 Pa) obtained with rotary pumps. Because the plasma produced with the developed system has the similar properties as those of dc plasmas basically, we can utilize simple discharge electrodes such as parallel plates that would be extended for large area processing in a low cost. In addition, the plasma driven by the bipolar pulses from the inverter circuit has a charge-up cancellation function that is advantageous to isolated surface treatments.We have obtained the following results from this research.1.We produced an Ar plasma at a pressure of 100 Pa between a pair of parallel-plate electrodes. The peak plasma density and temperature were 1〜6×10^<10> cm^<-1> and 2〜6 eV, which indicates that this discharge can be applicable to practical surface treatment and film deposition.2.Using an asynchronous high-voltage alternating pulsing mode, we have improved the adhesion property of a sputtering thin film under the above middle pressure region.Next, a diamond-like carbon (DLC) film deposition experiment has been performed. The DLC films have deposited on SUS304 and Si (100) substrates under a pressure of 100〜600Pa (methane) at a deposition rate of 1.5μm/h. The basic characteristics of the DLC films have been estimated with film thickness measurement, micro Vickers hardness test, AFM, FTIR, and Raman Scattering Spectroscopy. As a practical result of a sliding test, we have also observed the decrease of the kinetic friction coefficient between metal parts coated with the DLC films.

将逆变器直接驱动技术引入到旋转泵获得的中背景压力（10^1〜10^3 Pa）的直流辉光放电系统中。由于用所开发的系统产生的等离子体基本上具有与直流等离子体相似的特性，因此我们可以利用简单的放电电极（例如平行板），将其扩展到以低成本进行大面积处理。此外，由逆变器电路产生的双极脉冲驱动的等离子体具有充电抵消功能，有利于隔离表面处理。通过这项研究，我们得到了以下结果：1.我们在一对平行板电极之间产生了压力为100 Pa的Ar等离子体。峰值等离子体密度和温度分别为1〜6×10^<10> cm^<-1>和2〜6 eV，这表明该放电可适用于实际的表面处理和薄膜沉积。2.采用异步高压交变脉冲模式，提高了上述中压区域下溅射薄膜的附着性能。接下来，进行了类金刚石碳（DLC）薄膜沉积实验。已执行。在100〜600Pa（甲烷）压力下，以1.5μm/h的沉积速率在SUS304和Si（100）基板上沉积DLC薄膜。通过膜厚测量、显微维氏硬度测试、AFM、FTIR 和拉曼散射光谱评估了 DLC 膜的基本特性。作为滑动测试的实际结果，我们还观察到涂有 DLC 薄膜的金属部件之间的动摩擦系数有所降低。