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Magnetron Co-Sputtering System

磁控共溅射系统

基本信息

批准号：
468939474
负责人：
金额：
--
依托单位：
Technische Universität Darmstadt
依托单位国家：
德国
项目类别：
Major Research Instrumentation
财政年份：
2021
资助国家：
德国
起止时间：
2020-12-31 至无数据
项目状态：
未结题

来源：
https://gepris.dfg.de/gepris/projekt/468939474?language=en
关键词：
Magnetron Co Sputtering System

项目摘要

Magnetron sputtering is a common method for synthesizing thin film systems for spintronics research, development and application. A co-sputtering system allows to synthesize layer systems and alloys from different elements in order to quickly transfer ideas from materials research into the application-oriented development of spintronic systems. The work of the applicant groups is in the area of intermetallic materials for spintronics, antiferromagnetic spintronics, spin-orbit torques, and magnetic as well as oxide nonvolatile memory elements. In the project applied for here, a modern, semi-automated magnetron co-sputtering facility with nine sources is to be acquired. Other requirements include deposition in ultra-high vacuum, reactive sputtering with nitrogen and oxygen, deposition at temperatures up to 700°C, and a flexible configuration of working distances and deposition angles between sources and substrate holder. The system will be used predominantly by the New Materials Electronics group at the Department of Electrical Engineering and Information Technology and will be the centerpiece of the group's experimental infrastructure. The integration with the cluster system of Pulsed Laser Deposition, Molecular Beam Epitaxy and Ion Beam Etching of the Thin Films group at the Department of Materials and Earth Sciences will significantly extend the experimental capabilities of both groups and strengthen the collaboration between the departments.

磁控溅射是自旋电子学研究、开发和应用中合成薄膜系统的常用方法。共溅射系统允许合成来自不同元素的层系统和合金，以便快速将材料研究的想法转移到自旋电子系统的面向应用的开发中。申请人小组的工作属于自旋电子学、反铁磁自旋电子学、自旋轨道扭矩以及磁性和氧化物非易失性存储元件的金属间材料领域。在此申请的项目中，将购买一座具有九个源的现代化半自动化磁控共溅射设备。其他要求包括超高真空沉积、氮气和氧气反应溅射、高达 700°C 温度的沉积，以及源和衬底支架之间工作距离和沉积角度的灵活配置。该系统将主要由电气工程和信息技术系的新材料电子小组使用，并将成为该小组实验基础设施的核心。与材料与地球科学系薄膜组的脉冲激光沉积、分子束外延和离子束刻蚀集群系统的集成将显着扩展两个组的实验能力并加强部门之间的合作。