Electron microscopy analysis by visualization of relationship between composition distribution and charge distribution in quantum well of GaN system

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Piezo electric field of InGaN layer in InGaN/GaN quantum well structure was measured by electron holography. This piezo electric field was caused by lattice strain along c-axis in InGaN layer. We calculated lattice constant from In composition according to Vegards law, and then estimated piezo-polarization. We prepared some samples with various thickness from one wafer. Electron holography was carried out for those samples and internal electric field value evaluated was 0.7±0.2 MV/cm. This value corresponds to the In composition 4.1±1.3% estimated from the theoretical calculation. On the other hand, Z-contrast STEM observation allowed us to evaluate the In composition 4.8±1.6%, which agree to the value obtained by electron holography.As for AlGaN/GaN quantum well structure, we established the sample preparation technique, e.g., Samples were thinned by wedge-polishing method followed by Ar-ion milling with low voltage, so that the sample thickness was 50-100 nm. This thickness was enough thin to be observed by HRTEM and Z-contrast STEM, and electron holography. From these comprehensive studies, it was found that piezo electric field of AlGaN in AlGaN/GaN quantum well is considerably small rather than InGaN in InGaN/GaN quantum well, suggesting that minimization of damage layer on the sample surfaces and precise thickness measurement are indispensable.