MAXCoat - Deposition and Properties of MAX phase functional films and coatings

MAXCoat - MAX 相功能薄膜和涂层的沉积和性能

• 批准号: 48226766
• 负责人: Professor Dr. Peter Schaaf
• 金额: --
• 依托单位: Fachgebiet Werkstoffe der Elektrotechnik (WET)
• 依托单位国家: 德国
• 项目类别: Research Grants
• 财政年份: 2007
• 资助国家: 德国
• 起止时间: 2006-12-31 至 2015-12-31
• 项目状态: 已结题
• 来源: https://gepris.dfg.de/gepris/projekt/48226766?language=en
• 关键词: MAXCoat; Deposition; Properties; MAX; phase

MAX phases are seen as an innovative material with interesting physical and chemical properties, which get into research focus only a few years ago. Based on their special nanolaminate structure, they are combining the usually contradicting properties of ceramics and metals in a single material. Thus, their technological use are functional ceramics is attracting much interest in them. Having a high oxidation resistance up to 1300 C, a good electrical and thermal conductivity and high strength at the same time, they are also ductile, shock resistant and machinable. The production of such MAX phases as films or coatings is only barely investigated, but such coatings have a tremendous technical potential. Thus, it is the main goal of this project to obtain methods and strategies for the reliable productions of MAX phase coatings and films, e.g. by pulsed laser deposition (PLD). The produced MAX films are then investigated for their properties and possible industrial applicability. A focus is put in their application as coatings for extreme electricity conditions (highest voltages, highest currents). In addition, their production and properties for electronic applications will be investigated.

MAX相被视为具有有趣的物理和化学性质的创新材料，仅在几年前才成为研究热点。基于其特殊的纳米层压结构，它们将陶瓷和金属通常相互矛盾的特性结合在一种材料中。因此，它们作为功能陶瓷的技术应用引起了人们的极大兴趣。具有高达1300 ℃的高抗氧化性，良好的导电性和导热性，同时具有高强度，它们还具有延展性，耐冲击性和可加工性。这种MAX相作为薄膜或涂层的生产几乎没有研究，但这种涂层具有巨大的技术潜力。因此，本项目的主要目标是获得MAX相涂层和薄膜的可靠生产方法和策略，例如通过脉冲激光沉积（PLD）。 生产的MAX薄膜，然后研究其性能和可能的工业适用性。重点放在它们作为极端电气条件（最高电压，最高电流）涂层的应用上。此外，他们的生产和电子应用的性能将进行调查。

项目成果

Thin Film Synthesis of Ti3SiC2 by Rapid Thermal Processing of Magnetron‐Sputtered TiCSi Multilayer Systems

磁控溅射 TiCSi 多层系统快速热处理合成 Ti3SiC2 薄膜

• DOI: 10.1002/adem.201200180
• 发表时间: 2013
• 期刊: Advanced Engineering Materials
• 影响因子: 3.6
• 作者: Hopfeld;Marcus ;Grieseler;Thomas ;Marcus ;Schaaf
• 通讯作者: Schaaf

Nanostructured plasma etched, magnetron sputtered nanolaminar Cr2AlC MAX phase thin films

• DOI: 10.1016/j.apsusc.2013.12.099
• 发表时间: 2014-02-15
• 期刊: APPLIED SURFACE SCIENCE
• 影响因子: 6.7
• 作者: Grieseler, Rolf;Haehnlein, Bernd;Schaaf, Peter
• 通讯作者: Schaaf, Peter

Tribological behavior of selected Mn + 1AXn phase thin films on silicon substrates

• DOI: 10.1016/j.surfcoat.2014.08.034
• 发表时间: 2014-10
• 期刊: Surface & Coatings Technology
• 影响因子: 5.4
• 作者: M. Hopfeld;R. Grieseler;A. Vogel;H. Romanus;P. Schaaf