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Circuitries for efficient power injection to extremely small volumes for microplasma creation and their applications

Circuitries for efficient power injection to extremely small volumes for microplasma creation and their applications
用于向极小体积进行高效功率注入以产生微等离子体及其应用的电路
批准号:
15075203
负责人:
ISHII Shozo
金额:
$47.87万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research on Priority Areas
财政年份:
2003
资助国家:
日本
项目状态:
已结题
起止时间:
2003 至 2007

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中文摘要
翻译
提出并讨论了大气压下微等离子体产生方法中的质量限制模式。等离子体是利用具有小体积的任何物质状态(即固体、液体和气体)的放电产生的。众所周知,等离子体主要由气体产生。然而,这在微等离子体领域发生了变化。对于固体,通过脉冲放电用直径为100mm的铜粉颗粒产生等离子体。对于液体,在脉冲放电中使用乙醇的液滴或细丝。灯丝从泰勒锥的尖端生长,泰勒锥是由电极之间的静电力产生的。在这两种情况下,等离子体是通过复杂的过程产生的,包括加热,熔化,蒸发和电离的材料。对于气体,一个微型气流通过一个小的金属喷嘴开发直流辉光微放电在空气中。工作气体为氦气或氩气。采用该气流的特点是产生具有薄圆柱结构的稳定微等离子体,并且用相同的电极系统获得任何放电模式,电晕,辉光和电弧放电。后者的特点是有用的等离子体应用和放电物理分析。我们研制了大气压直流微等离子体产生沿着垂直相交的两个微型气流。该方案使我们能够在电极之间的狭窄空间的外部获得微等离子体,从而开发各种应用。讨论了脉冲和射频等离子体的产生,建立了高功率注入和沉积类金刚石薄膜的方法。提出并发展了利用微小气体流量产生电解质阴极辉光放电的新方案。等离子体和溶液之间的界面处的现象将用于化学和材料科学中的应用。
英文摘要
We proposed and discussed a mass limited mode in the methods of microplasma generation under atmospheric pressure. The plasma is generated using electrical discharges with any state of mater, namely, solid, liquid, and gas, having a small volume. It is common knowledge that plasmas are created mostly with gases. This, however, has altered in the field of microplasmas. For solids, the plasma was generated with a copper powder particle of 100mm in diameter by pulsed discharge. For liquids, a droplet or a filament of ethanol was used in pulsed discharges. The filament was grown from the tip of a Taylor cone, which was created by the electrostatic force between electrodes. In both cases, the plasmas were generated through the complicated process including heat, melt, vaporization, and ionization of materials. For gases, a miniature gas flow through a small metal nozzle developed to dc glow microdischarges in air. The working gas was helium or argon. The features of adopting the gas flow are that stable microplasmas with thin cylindrical structures are generated and any discharge modes, corona, glow, and arc discharges, are obtained with the same electrode system. The latter feature is useful for plasma applications and the analysis of discharge physics. We developed atmospheric dc microplasma generated along perpendicularly intersecting two miniature gas flows. This scheme enables us to obtain the microplasma in the outside of the narrow space between electrodes and, consequently, to develop a variety of applications. Discussing the plasma generation by pulse or radio-frequency power, we established high-power injection and deposition of diamond like carbon film on substrates. New schemes to generate electrolyte cathode glow discharge with the miniature gas flow were proposed and developed. Phenomena at the interface between the plasma and the solution will be used for the applications in chemistry and material science.
期刊论文(170)
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会议论文
A microplasma created from a powder particle by pulsed discharges
通过脉冲放电由粉末颗粒产生的微等离子体
DOI: --
发表时间: 2003
期刊:
影响因子: --
作者: [橘 邦英, 寺嶋和夫 監修, S. Ishii]
通讯作者: S. Ishii
Pulsed discharge with an ethanol droplet for Microplasma generation
使用乙醇液滴进行脉冲放电以产生微等离子体
DOI: --
发表时间: 2006
期刊: Proc.6th Int, Conf.on Reactive Plasmas & 23rd Symp.on Plasma Processing
影响因子: --
作者: [T.J.Konno, K.Bandoh, N.Shirai]
通讯作者: N.Shirai
DOI: --
发表时间: 2007
期刊:
影响因子: --
作者: [K. Nanno, T. Yamauchi, S. Ibuka, K. Yasuoka, S. Ishii]
通讯作者: S. Ishii
Generation of microplasma by pulsed discharge of a liquid filament
通过液体丝的脉冲放电产生微等离子体
DOI: --
发表时间: 2007
期刊:
影响因子: --
作者: [N. Shirai, K. Matsui, S. Ibuka, K. Yasuoka, S. Ishii]
通讯作者: S. Ishii
共 49 条
    Compact hydrogen reformer system utilizing microplasmas
    • 批准号:
      15360147
    • 项目类别:
      Grant-in-Aid for Scientific Research (B)
    • 资助金额:
      $10.05万
    • 财政年份:
      2003
    • 负责人:
      ISHII Shozo
    • 依托单位:
    Fast High Voltage Pulse Generator with Nonlinear Transmission Line
    • 批准号:
      07555087
    • 项目类别:
      Grant-in-Aid for Scientific Research (A)
    • 资助金额:
      $6.34万
    • 财政年份:
      1995
    • 负责人:
      ISHII Shozo
    • 依托单位:
    Dense Plasma Formation by Carbon Thin Film Liner Compression
    • 批准号:
      62580002
    • 项目类别:
      Grant-in-Aid for General Scientific Research (C)
    • 资助金额:
      $1.34万
    • 财政年份:
      1987
    • 负责人:
      ISHII Shozo
    • 依托单位:
    Carbon-fiber Discharge Plasmas as a Soft X-ray Source for Calibration
    • 批准号:
      60580004
    • 项目类别:
      Grant-in-Aid for General Scientific Research (C)
    • 资助金额:
      $1.02万
    • 财政年份:
      1985
    • 负责人:
      ISHII Shozo
    • 依托单位:
    海外基金