Nanoscale Scanning Tip-based Electron Beam Induced Deposition from the Gas-phase for Highly Localized 3D Material Deposition (TEBID)

基于纳米级扫描尖端的气相电子束诱导沉积，用于高度局域化 3D 材料沉积 (TEBID)

• 批准号: 508501791
• 负责人: Professor Dr.-Ing. Steffen Strehle
• 金额: --
• 依托单位: Fachgebiet Mikromechanische Systeme
• 依托单位国家: 德国
• 项目类别: Research Grants
• 资助国家: 德国
• 项目状态: 未结题
• 来源: https://gepris.dfg.de/gepris/projekt/508501791?language=en
• 关键词: Nanoscale; Scanning; Tip; based; Electron

High-performance patterning techniques for the precise generation of functional 3D nanostructures are of elementary importance for the fabrication of novel micro- and nanosensors up to the realization of the second quantum revolution. In the research project, the fundamental mechanisms of a scanning tip-based electron beam induced deposition (TEBID) from the gas-phase as well as the associated technological requirements and limitations will be elucidated. The aim is to evaluate the potential of this technology in the direction of 3D nanomaterial synthesis and the construction of nanoelectromechanical systems as well as to discuss its future implementation and further development. Based on the experiments on local 3D deposition of carbon nanostructures, the fundamental TEBID influencing parameters that are relevant for a controlled and reproducible 3D deposition will be identified and explored. The used field emitter scanning probes are primarily based on active microcantilevers with diamond modification. In addition to a controlled movement of the field emission scanning probe, the influence of the tip morphology and material, the gas used and the influence of the substrate are investigated in particular in terms of a highly localized 3D deposition. In this context, parasitic influences are also considered. An experimental TEBID setup for use in a scanning electron microscope with gas injection system is planned for the investigations. The investigations will be accompanied by a comprehensive material analysis as well as by simulations. On this basis, an improved understanding of TEBID will be developed, which can be discussed in comparison to the established electron and ion beam induced deposition.

精确生成功能性3D纳米结构的高性能图案化技术对于实现第二次量子革命的新型微米和纳米传感器的制造至关重要。在该研究项目中，将阐明基于扫描尖端的电子束诱导沉积（TEBID）的基本机制以及相关的技术要求和限制。其目的是评估该技术在3D纳米材料合成和纳米机电系统构建方面的潜力，并讨论其未来的实施和进一步发展。基于对碳纳米结构的局部3D沉积的实验，将识别和探索与受控和可再现的3D沉积相关的基本TEBID影响参数。所使用的场发射扫描探针主要基于具有金刚石改性的有源微悬臂梁。除了场发射扫描探针的受控运动之外，特别是在高度局部化的3D沉积方面，研究了尖端形态和材料的影响、所使用的气体和基板的影响。在这种情况下，寄生的影响也被认为是。一个实验TEBID设置用于扫描电子显微镜与气体注入系统计划的调查。调查将伴随着全面的材料分析以及模拟。在此基础上，一个更好的理解TEBID将开发，这可以讨论比较建立电子和离子束诱导沉积。