Nanoscale Scanning Tip-based Electron Beam Induced Deposition from the Gas-phase for Highly Localized 3D Material Deposition (TEBID)

精确生成功能三维纳米结构的高性能图像化技术对于制造新型微纳米传感器直至实现第二次量子革命至关重要。在本研究项目中，将阐明基于扫描尖端的气相电子束诱导沉积（TEBID）的基本机理，以及相关的技术要求和局限性。目的是评估该技术在三维纳米材料合成和纳米机电系统构建方向上的潜力，并讨论其未来的实施和进一步发展。在碳纳米结构局部三维沉积实验的基础上，确定和探索与可控和可复制三维沉积相关的基本TEBID影响参数。使用的场发射扫描探头主要是基于金刚石修饰的有源微悬臂梁。除了场发射扫描探针的控制运动外，还研究了尖端形貌和材料的影响，所使用的气体以及衬底的影响，特别是在高度局部化的3D沉积方面。在这种情况下，还考虑了寄生影响。设计了一个用于扫描电子显微镜的TEBID实验装置，该装置带有气体注入系统。在进行调查的同时，将进行全面的材料分析和模拟。在此基础上，对TEBID有了更深入的了解，并与已有的电子和离子束诱导沉积进行了比较。

High-performance patterning techniques for the precise generation of functional 3D nanostructures are of elementary importance for the fabrication of novel micro- and nanosensors up to the realization of the second quantum revolution. In the research project, the fundamental mechanisms of a scanning tip-based electron beam induced deposition (TEBID) from the gas-phase as well as the associated technological requirements and limitations will be elucidated. The aim is to evaluate the potential of this technology in the direction of 3D nanomaterial synthesis and the construction of nanoelectromechanical systems as well as to discuss its future implementation and further development. Based on the experiments on local 3D deposition of carbon nanostructures, the fundamental TEBID influencing parameters that are relevant for a controlled and reproducible 3D deposition will be identified and explored. The used field emitter scanning probes are primarily based on active microcantilevers with diamond modification. In addition to a controlled movement of the field emission scanning probe, the influence of the tip morphology and material, the gas used and the influence of the substrate are investigated in particular in terms of a highly localized 3D deposition. In this context, parasitic influences are also considered. An experimental TEBID setup for use in a scanning electron microscope with gas injection system is planned for the investigations. The investigations will be accompanied by a comprehensive material analysis as well as by simulations. On this basis, an improved understanding of TEBID will be developed, which can be discussed in comparison to the established electron and ion beam induced deposition.