权益分类	功能权益	普通用户	{{item.name}}会员
{{category.name}}	{{benefitItem.name}}

Device for Pulsed Laser Deposition (PLD) of thin films

薄膜脉冲激光沉积 (PLD) 装置

基本信息

批准号：
517533428
负责人：
金额：
--
依托单位：
Universität Stuttgart
依托单位国家：
德国
项目类别：
Major Research Instrumentation
财政年份：
2023
资助国家：
德国
起止时间：
2022-12-31 至无数据
项目状态：
未结题

来源：
https://gepris.dfg.de/gepris/projekt/517533428?language=en
关键词：
Device Pulsed Laser Deposition PLD

项目摘要

We request a device for pulsed laser deposition (PLD) of thin films, which uses a KrF excimer laser with a wavelength of 248 nm. The chemical focus will be set on depositing films of mainly oxides, but also other complex compounds like oxyfluorides, fluorides, or silicides, as well as carbon materials (amorphous, or diamond like carbon), other chalkogenides or materials for solar cells will be targeted. With the device, both epitaxial as well as polycrystalline films will be grown, and the growth will be monitored in-situ with an integrated RHEED system. The substrate temperature will reach temperatures upto 900 - 1000 °C, and laser pulse, frequency, type and pressure of gas and distances to the target will be varied. The obtained films will be characterized regarding their functional properties via a variety of methods available, among them magnetisation measurements, impedance spectroscopy, as well as electrochemical characterization). By this, we aim to synthesize not only functional materials which cannot be obtained via conventional synthesis routes, but also multilayer systems as prototype for various applications (among them fluoride ion batteries). The system should be user-friendly with low safety requirements to make it accessible to the various users at University of Stuttgart. Via a connection to an available glovebox system, residual partial pressures will be further minimized and handling of sensitive samples will be facilitated.

我们要求一种用于薄膜的脉冲激光沉积（PLD）的装置，其使用波长为248 nm的KrF受激准分子激光器。化学重点将放在沉积主要氧化物的薄膜上，但也有其他复杂化合物，如氟氧化物，氟化物或硅化物，以及碳材料（无定形或金刚石状碳），其他chalkogenides或太阳能电池材料将成为目标。与该设备，外延以及多晶薄膜将生长，和生长将在现场监测与集成RHEED系统。衬底温度将达到高达900 - 1000 °C的温度，并且激光脉冲、频率、气体的类型和压力以及到目标的距离将变化。所获得的膜将通过各种可用的方法表征其功能特性，其中包括磁化强度测量、阻抗谱以及电化学表征。因此，我们的目标不仅是合成通过常规合成途径无法获得的功能材料，而且还合成作为各种应用（其中包括氟离子电池）原型的多层系统。该系统应该是用户友好的，安全要求低，使其在斯图加特大学的各种用户访问。通过连接到可用的手套箱系统，残余分压将进一步降至最低，并有助于敏感样品的处理。