CONTROL OF ACTIVE SITE FOR SUPPORTED METAL CATALYST BY SUPERCRITICAL DRYING METHOD

超临界干燥法对负载型金属催化剂活性位点的控制

• 批准号: 09450299
• 负责人: IGARASHI Akira
• 金额: $ 5.44万
• 依托单位: KOGAKUIN UNIVERSITY
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (B)
• 财政年份: 1997
• 资助国家: 日本
• 起止时间: 1997 至 1999
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-09450299/
• 关键词: Catalyst Preparation; Supported Metal Catalyst; Impregnated catalyst; Supercritical Drying; Ni; SiO_2; Pt; Al_2O_3; 分布制御; ゾル-ゲル; ベンゼンの水素化

In order to obtain a supported metal catalyst with a well-dispersed metal component, supercritical drying was adopted instead of using a conventional thermal drying in preparation by impregnation method.First, Ni/SiO_2 catalysts were prepared by the solution-sol-gel method and the subsequent removal of the solvent via low-temperature supercritical drying (LTSCD) using CO_2 as a supercritical fluid. The results indicated that Ni over SiO_2 support prepared by LTSCD has well-dispersed Ni particles and the particle size distribution of Ni is uniformly.Furthermore, Ni/SiO_2 catalysts prepared by LTSCD showed the superior catalytic performance for benzene hydrogenation to cyclohexane as compared with the Ni/SiO_2 catalyst prepared by a conventional thermal drying.Second, it was found that the Pt dispersion of Pt/Al_2O_3 catalysts prepared by LTSCD using CO_2 improves 60% in comparison with the conventional impregnation method. This result is a large result of showing the possibility of drastically reducing the Pt amount.Finally, the high-temperature supercritical drying (HTSCD) equipment was manufactured. Ni/SiO_2 catalysts prepared by HTSCD had well-dispersed Ni particles and the superior catalytic performance, in comparison with Ni/SiO_2 catalysts prepared by LTSCD.

为了获得金属组分分散良好的负载型金属催化剂，采用超临界干燥代替浸渍法制备中的常规热干燥，首先采用溶液-溶胶-凝胶法制备Ni/SiO2催化剂，然后以CO2为超临界流体，通过低温超临界干燥（LTSCD）除去溶剂。结果表明，低温干燥法制备的Ni/SiO_2催化剂中Ni颗粒分散均匀，Ni颗粒大小分布均匀，对苯加氢制环己烷的催化性能上级常规热干燥法制备的Ni/SiO_2催化剂。结果表明，用CO_2作溶剂的低温SCD法制备的Pt/Al_2O_3催化剂的Pt分散度比传统浸渍法提高了60%。该结果是显示出大幅度减少Pt量的可能性的大的结果。最后，制造了高温超临界干燥（HTSCD）设备。与LTSCD法制备的Ni/SiO_2催化剂相比，HTSCD法制备的Ni/SiO_2催化剂具有良好的分散性和上级催化性能。

项目成果

名達 豪: "超臨界乾燥法により得られたニッケル/シリカ触媒の構造と反応性" 触媒. 39,No.6. 470-473 (1997)

Go Nada：“通过超临界干燥法获得的镍/二氧化硅催化剂的结构和反应性”，《催化》39，第6期470-473（1997）。

A.Igarashi: "Utilization of Supercritical Drying Processes"The sharing and writing of book. Chap.2, Paragraph. 17 (2000)

A.五十岚：《超临界干燥工艺的利用》一书的分享和撰写。

五十嵐 哲: "超臨界乾燥法を用いた触媒調製"触 媒. 39,No.4. 275-280 (1997)

Satoshi Igarashi：“使用超临界干燥法制备催化剂” Catalyst 39，No. 4. 275-280 (1997)

五十嵐 哲: "超臨界乾燥法を用いた触媒調製"触媒. 39. 275-280 (1997)

Satoshi Igarashi：“使用超临界干燥法制备催化剂”Catalyst 39. 275-280 (1997)。

五十嵐 哲: "超臨界流体プロセスの実用化(分担報筆)(第2章第2節)"技術情報協会. 17 (2000)

Satoshi Igarashi：“超临界流体过程的实际应用（贡献者）（第 2 章第 2 节）”技术信息协会 17 (2000)。