PVD-/PACVD-Unit

PVD/PACVD 装置

• 批准号: 518562099
• 金额: --
• 依托单位: Universität Bayreuth
• 依托单位国家: 德国
• 项目类别: Major Research Instrumentation
• 财政年份: 2023
• 资助国家: 德国
• 起止时间: 2022-12-31 至 无数据
• 项目状态: 未结题
• 来源: https://gepris.dfg.de/gepris/projekt/518562099?language=en
• 关键词: PVD; PACVD; Unit

Within the scope of this major research instrumentation proposal, a coating unit is requested for research purposes, which is based on physical vapor deposition (PVD) and plasma-assisted chemical vapor deposition (PACVD) as process technology. With these processes, it is possible to deposit a variety of materials on substrates as a thin layer (a few micrometers thickness) by physical and/or plasma-activated chemical processes. For the planned research projects, the preferred PVD process is cathodic sputtering. In this process, ions of an inert gas are accelerated towards a solid target switched as a cathode, and the coating material is sublimated from this target in mainly atomic form in the course of a collision cascade, so that the coating material is present in gaseous form in the evacuated coating chamber from this point on. Following a transport phase, a solid, thin film is deposited on the substrate by condensation of these atoms. The equipment applied for has been designed by the manufacturer for the above-mentioned process technologies and corresponds to the current state of the art. The functionality of the films is due to the film material and the process used, whereby combinations of materials and processes are possible. Layer properties and characteristics can be specifically adjusted by varying the deposition parameters (such as chamber temperature, cathode power, substrate movement, etc.). Of particular interest for the planned research projects are tribologically effective coatings (friction and wear reduction), biocompatible coatings and coatings that allow the integration of additional functions in surfaces, such as condition monitoring, measurement or energy harvesting. They are used, for example, in drive technology, energy technology and medical technology.

在这项主要的研究仪器提案范围内，要求涂料单元用于研究目的，该研究基于物理蒸气沉积（PVD）和血浆辅助化学蒸气沉积（PACVD）作为过程技术。通过这些过程，可以通过物理和/或等离子体激活的化学过程将各种材料作为薄层（几微米厚度）放置在底物上。对于计划的研究项目，首选的PVD过程是阴极溅射。在此过程中，将惰性气体的离子加速朝着作为阴极切换的固体靶标加速，并且在碰撞级联过程中，涂层材料主要以原子形式从该靶标中升华，以便从此点，以疏散的涂层形式以气态形式存在涂层。在传输阶段之后，通过这些原子的缩合将固体薄膜沉积在基板上。应用的设备是由制造商设计的上述工艺技术，与当前的最新状态相对应。薄膜的功能是由于膜材料和所使用的过程所致，因此可以结合材料和过程。可以通过改变沉积参数（例如腔室温度，阴极功率，底物运动等）来特异性调整层的性能和特性。对于计划的研究项目，特别感兴趣的是摩擦学有效的涂料（摩擦和磨损），生物相容性涂料和涂层，允许在表面中整合其他功能，例如条件监测，测量或能量收获。例如，它们用于驱动技术，能源技术和医疗技术。