PVD-/PACVD-Unit

PVD/PACVD 装置

• 批准号: 518562099
• 金额: --
• 依托单位: Universität Bayreuth
• 依托单位国家: 德国
• 项目类别: Major Research Instrumentation
• 财政年份: 2023
• 资助国家: 德国
• 起止时间: 2022-12-31 至 无数据
• 项目状态: 未结题
• 来源: https://gepris.dfg.de/gepris/projekt/518562099?language=en
• 关键词: PVD; PACVD; Unit

Within the scope of this major research instrumentation proposal, a coating unit is requested for research purposes, which is based on physical vapor deposition (PVD) and plasma-assisted chemical vapor deposition (PACVD) as process technology. With these processes, it is possible to deposit a variety of materials on substrates as a thin layer (a few micrometers thickness) by physical and/or plasma-activated chemical processes. For the planned research projects, the preferred PVD process is cathodic sputtering. In this process, ions of an inert gas are accelerated towards a solid target switched as a cathode, and the coating material is sublimated from this target in mainly atomic form in the course of a collision cascade, so that the coating material is present in gaseous form in the evacuated coating chamber from this point on. Following a transport phase, a solid, thin film is deposited on the substrate by condensation of these atoms. The equipment applied for has been designed by the manufacturer for the above-mentioned process technologies and corresponds to the current state of the art. The functionality of the films is due to the film material and the process used, whereby combinations of materials and processes are possible. Layer properties and characteristics can be specifically adjusted by varying the deposition parameters (such as chamber temperature, cathode power, substrate movement, etc.). Of particular interest for the planned research projects are tribologically effective coatings (friction and wear reduction), biocompatible coatings and coatings that allow the integration of additional functions in surfaces, such as condition monitoring, measurement or energy harvesting. They are used, for example, in drive technology, energy technology and medical technology.

在这项主要研究仪器提案的范围内，需要一个用于研究目的的涂层装置，该装置基于物理气相沉积（PVD）和等离子辅助化学气相沉积（PACVD）作为工艺技术。通过这些工艺，可以通过物理和/或等离子体激活的化学工艺将各种材料沉积在基材上，形成薄层（几微米厚）。对于计划的研究项目，PVD的首选工艺是阴极溅射。在这个过程中，惰性气体的离子被加速到作为阴极的固体靶上，涂层材料在碰撞级联的过程中以主要的原子形式从该靶上升华出来，因此涂层材料从此时开始在真空的涂层室中以气态形式存在。经过一个输运阶段后，这些原子通过缩合作用在衬底上沉积了一层固体薄膜。所申请的设备是由制造商根据上述工艺技术设计的，符合目前的技术水平。薄膜的功能是由于薄膜材料和所使用的工艺，因此材料和工艺的组合是可能的。可以通过改变沉积参数（如腔室温度、阴极功率、衬底移动等）来具体调整层的性质和特征。计划中的研究项目特别感兴趣的是摩擦学上有效的涂层（减少摩擦和磨损），生物相容性涂层和允许在表面集成附加功能的涂层，例如状态监测，测量或能量收集。例如，它们被用于驱动技术、能源技术和医疗技术。