Physical vapour deposition

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The Department of Computer Sciences and Microsystems Technology, and the research focus area "Integrated Miniaturized Systems" (IMS) require a system for physical vapor deposition (PVD) to research modern micro- and nanosystems. The IMS research focus area (www.hs-kl.de/ims) is very successful and conducts numerous, mainly third-party funded, research projects, with high quality scientific publications. A particular research focus is on interdisciplinary projects at the interface of life sciences and microsystems technology, developing, for example, novel biosensors, electrode arrays and electrophysiological measurement systems. To manufacture such systems, the PVD applied for is needed as a central component of a fabrication process chain in the clean room. The procurement is urgently required because the currently available system can only be used to a limited extent due to the age of the equipment and its inability to be repaired. PVD is particularly suitable for depositing very thin layers, up to partial monolayers, especially of electrically conductive metals, on a substrate. These layers have excellent quality and homogeneity, meeting the requirements of demanding microsystems research. PVD is an established process in microsystems technology and is used in particular to produce electrodes and conductive tracks, e.g. for biosensors or electrode arrays for deriving neuronal or other electrophysiological signals from individual cells or tissues. The combination of different material classes enables the production and research of novel sensor systems. For example, in the field of biosensors, graphene and other nanomaterials now play an important role, requiring metallic leads made of gold or platinum. In the field of magnetic sensors, complex layer systems of iron, nickel, cobalt and molybdenum are increasingly being used. A versatile PVD system is needed to deposit these different materials. In particular, for the deposition of high-density and low-defect coatings, the system requires an electron beam evaporation source with sources that can be changed under vacuum. For fast deposition of thicker coatings, additional sources for thermal deposition are needed. By using this system for the fabrication of novel micro- and nanostructures, we expect a high gain in knowledge in the context of ongoing and planned research projects. The PVD system is an important link in a process chain in the clean room and will be complemented by other existing equipment on site. The department has many years of experience in the operation of cleanroom facilities. All personnel and infrastructure requirements for operating the tool are already in place at the site.