Film formation by thermoelectron activation RF ion plating and it's controle.

点击翻译按钮获取中文摘要

A tungsten filament to emit thermoelectrons was installed to a radio frequency ion plating apparatus. Using this apparatus, a steel and Zn-Al eutectic alloy were coated with TiN by thermoelectron activation RF ion plating method. Vias voltages of -200 to -400 are applied. The voltages have fairly large effects on the crystal orientation of TiN TiN films. Gas pressure can be lowered to 3/ <10^(-4)> torr. Gas pressure and deposition rate relates to film colour and composition.Using the same apparatus, Zr, Nb and Al were ion plated in nitogen gas atmosphere, These metals have high melting points or high thermal conductivity, so RF source of high power is needed to melt and evapolate the metals with a water cooled copper hearth.