Film formation by thermoelectron activation RF ion plating and it's controle.

热电子活化射频离子镀膜形成及其控制。

• 批准号: 60550502
• 负责人: URAO Ryoichi
• 金额: $ 0.64万
• 依托单位: Faculty of Engineering, Ibaraki University.
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for General Scientific Research (C)
• 财政年份: 1985
• 资助国家: 日本
• 起止时间: 1985 至 1986
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-60550502/
• 关键词: Ion plating; Dry plating; coating; RF plasma; 窒化チタン

A tungsten filament to emit thermoelectrons was installed to a radio frequency ion plating apparatus. Using this apparatus, a steel and Zn-Al eutectic alloy were coated with TiN by thermoelectron activation RF ion plating method. Vias voltages of -200 to -400 are applied. The voltages have fairly large effects on the crystal orientation of TiN TiN films. Gas pressure can be lowered to 3/ <10^(-4)> torr. Gas pressure and deposition rate relates to film colour and composition.Using the same apparatus, Zr, Nb and Al were ion plated in nitogen gas atmosphere, These metals have high melting points or high thermal conductivity, so RF source of high power is needed to melt and evapolate the metals with a water cooled copper hearth.

将发射热电子的钨丝安装到射频离子镀设备。利用该装置对钢和锌铝共晶合金进行了热电子激活射频离子镀TiN涂层研究。施加-200至-400的通孔电压。电压对TiN薄膜的晶体取向有较大的影响。气体压力可以降低到3/ <10^（-4）> kPa。在同一台设备上，在氮气氛中离子镀Zr、Nb和Al，由于这些金属具有高熔点或高导热性，因此需要高功率的射频源，用水冷铜底进行熔化和共渗。

项目成果

Ryoichi Urao, Makoto Oishi, etc.: "TiN coating of a Zn-Al eutectic alloy by thermoelectron activation RF ion plating method." Journal of the Faculty of Engineering Ibaraki University.34. 45-50 (1986)

Ryoichi Urao、Makoto Oishi等：“通过热电子激活射频离子镀法对Zn-Al共晶合金进行TiN涂层”。

浦尾亮一 他: 茨城大学工学部研究集報. 34. 45-50 (1986)

Ryoichi Urao 等人：茨城大学工学部研究通报 34. 45-50 (1986)

町井律雄,浦尾亮一 他: 日本機械学会・精機学会共催日立地方講演会講演論文集. (1960)

Ritsuo Machii、Ryoichi Urao 等：日本机械工程师学会和日本精密机械工程师学会联合主办的日立地区讲座论文集（1960 年）。

Ritsuo Machii, Ryoichi Urao, etc.: "Titanium nitride coating by thermoelectron activation RF ion plating and the property of coating layer." Proc. Conference in Hitachi, JSME and JSPE.39. 144-146 (1985)

Ritsuo Machii、Ryoichi Urao等：“热电子活化射频离子镀氮化钛涂层及涂层性能”。