Research of Fabrication and Application of functional micro-optical-element using soft X ray and deep ultra-violet lithography

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With the rapid development of opto-electronic systems, micro-optic devices are expected to find wide applications as input output elements with laser source. In potical circuits the functions of focusing, splitting and time delay of potical beam are required. These requirements can be fulfilled by using micro-fresnel zone plate elements. This research project investigated a trial to design and fabrication an efficient grating type micro-optical element which is applicable to OEIC and we found the following results.(1) Micro fresnel zone plate has the special merit of its planar structure and flexibility in the desing of focusing characterisity. Using a composite zone plate and two zone plates, the delay unit was implemented. The composite zone plate acted as space-division beam splitter. The proportionality relationship between the optical pulse interval and spatial displacement of a fiber end was confirmed for a dynamic range of 300 ps, using a laser diode of 40 ps FWHM.(2) A comparis … More on between the experiment and the computer simulation based on the floque Bloch expansion of transmission grating at non-Bragg condition. Achievement of high diffraction efficiency without utilizing either volume hologram or blazed holigram favors the prospect of micro-optic grating components with planar structure based on lithographic technique.(3) A trial to design and fabricate an efficient spatially divided beam splitter which is applicable to OEIC. A new configuration of a spatially divided beam splitter is proposed, which is composed of a cylindorical lens and a planar linear zone plate array with oblique incidence, utilizing quasi-Bragg conditions, to improve high diffraction efficiency is expected. By using a fabricated spatially divided beam splitter, the simultaneous focusing and splitting of a laser output are demonstrated.(4) A 1.25 um pitch grating with a blazed angle of 45 is successfully fabricated using a deep UV region of synchrotron radition lithography. The present technoligy is suitable for fabricating submicron grating devices in opto-electronic systems. Less