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PREPARATION OF SUPER PLASTICITY TITANIA BY CHEMICAL VAPOR DEPOSITION

PREPARATION OF SUPER PLASTICITY TITANIA BY CHEMICAL VAPOR DEPOSITION
化学气相沉积法制备超塑性二氧化钛
批准号:
04555228
负责人:
KOMIYAMA Hiroshi
金额:
$4.54万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Developmental Scientific Research (B)
财政年份:
1992
资助国家:
日本
项目状态:
已结题
起止时间:
1992 至 1993

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中文摘要
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英文摘要
It has been shown theoretically and experimentally that ceramic consisted of nanometer size grains (so-called nano-ceramic materials) overcame the characteristics of brittle which is the main drawback of the normal ceramics materials, and had high toughness. There has been a high expectation of its application for superior heat resistance and corrosion resistance, however, ceramic materials have not been put into practical materials because of the lower reliability as brittleness. We have been trying to do fundamental studies to create a novel mass-productive technology to make such nano-ceramic materials.The film growth of titania (TiO_2) series nano-ceramic material was tried by chemical vapor deposition (CVD) method in this research. Titanium tetra iso-propoxide (TTIP) is used in the conventional TiO_2-CVD process, however we found that replacement of TTIP with bis(dipivaloylmetanoto) diisopropoxide titanium (Ti(DPM)_2(O-iPr)_2) compound increases stability of reaction and controlla … More bility.In the second year, the new component materials such as Sr and Pb was added and its effect was examined. Our experimental results revealed that the added Pb compound reduced the secondary nucleation process. The recent greatest important issue is to control the grain size of the deposited film, it's also the aim of this research. It's said generally that the grain size of the deposited film was dominated the competition of the secondary nucleation rate and the film growth rate. However, these two rates were changed easily by various experimental conditions, so the control of the grain size has very difficulty. In the film forming process without secondary nucleation, it's known that the initial nucleation density as well as film thickness can dominate the grain size of the film. It's also shown that the fixed experimental condition which gives the most suitable initial nucleation density, and freely selectable deposition time provide us the controllability of the grain size. In conclusion, we have elucidated the novel way to control the grain size of the deposited films in CVD ceramics process. Less
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金 煕濱: "常圧熱CVDによるAlN膜合成における配向性の制御" 化学工学論文集. 18. 622-628 (1992)
Hee-bin Kim:“通过常压热 CVD 控制 AlN 薄膜合成中的取向”《化学工程杂志》18. 622-628 (1992)。
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通讯作者:
L.-S.Hong: "Sticking Probability of the Film Precursor in Epitaxial Growth of SiC Films by Chemical Vapor Deposition from SiH_4 and C_3H_8" Proc.of the 12th International Symp.on CVD. 401-407 (1993)
L.-S.Hong:“SiH_4 和 C_3H_8 化学气相沉积法外延生长 SiC 薄膜中薄膜前驱体的粘着概率”第 12 届国际 CVD 研讨会论文集。
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小宮山 宏: "CVDハンドブック" 朝倉書店, 800 (1991)
小宫山浩:《CVD手册》朝仓书店,800(1991)
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17
    THE CONSTRUCTION OF A CVD PROCESS WITH MATERIAL RECYCLE TO PRODUCE EFFICIENT SOLAR CELLS AT LOW-COST.
    • 批准号:
      08555186
    • 项目类别:
      Grant-in-Aid for Scientific Research (A)
    • 资助金额:
      $8.26万
    • 财政年份:
      1996
    • 负责人:
      KOMIYAMA Hiroshi
    • 依托单位:
    CONTROL OF THIN-FILM FORMATION PROCESSES BY MONOLAYER TREATMENTS ON A SURFACE OF SUBSTRATES
    • 批准号:
      08405051
    • 项目类别:
      Grant-in-Aid for Scientific Research (A)
    • 资助金额:
      $18.82万
    • 财政年份:
      1996
    • 负责人:
      KOMIYAMA Hiroshi
    • 依托单位:
    Analisys of CVD Process in Nano-Structured Ferro-Electric Thin Films
    • 批准号:
      06555232
    • 项目类别:
      Grant-in-Aid for Developmental Scientific Research (B)
    • 资助金额:
      $9.15万
    • 财政年份:
      1994
    • 负责人:
      KOMIYAMA Hiroshi
    • 依托单位:
    Designe and Evaluation of the Afforestation of Desort by Water Controll
    • 批准号:
      06303007
    • 项目类别:
      Grant-in-Aid for Co-operative Research (A)
    • 资助金额:
      $6.91万
    • 财政年份:
      1994
    • 负责人:
      KOMIYAMA Hiroshi
    • 依托单位:
    海外基金