Development of quantitative analysis system for electron microscope images observed with imaging plates

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A quantitative image processing system for electron microscope images obtained with imaging plates has been developed by utilizing the network system (TAINS) and an engineering work station. Basic properties of the imaging plates, such as the resolution and fading phenomena were also investigated. Based on the properties and using the quantitative analysis system, detailed analysis of electron diffraction patterns and high-resolution images was carried out. In the analysis of electron diffraction patterns, detailed intensity distribution of diffuse scattering in compound semiconductors was clearly analyzed to make clear the ordered atomic arrangement of the constituent elements. On the other hand, in the analysis of high-resolution electron microscope images, a residual index was introduced. By minimizing the residual index, deficiency of the constituent elements in a high-Tc superconductor was quantitatively analyzed. Since the quantitative analysis system can be applied to the image analysis with conventional EM films, it will be very useful in quantification for both electron diffraction patterns and high-resolution electron microscope images.