Detailed structure-analysis by using electron probe

该项目的目的是：(1)利用纳米尺寸的电子探针在互反空间进行结构分析；(2)先进的高分辨率纳米材料的电子显微复制，不包括空间平均过程。在1994-1997年，每位研究者都研究了以下主题，这些主题与他们以前的工作相吻合，并与本项目的上述目标一致。相干会聚束电子衍射、电子全息、纳米级电子衍射、准晶体高分辨率电子显微镜、新型记录介质（如成像板）的估计、硅的表面结构分析、精细金属半导体粒子的结构分析、非晶合金纳米级电子束衍射、原子团簇物理、硅的平面缺陷及其与光学性质的关系研究、和来自氧化物的会聚束电子衍射。

The purposes of the project are (1) structure-analysis in reciprocal space by using nmsized electron probe and (2) advanced high resolution electron microcopy of nano material excluding the spatial averaging process. In 1994-1997, each of the investigators studied the following topics which are fitted with the their previous works and on the line of the above targets of the present project.Coherent convergent beam electron diffraction, Electron holography, Nm-sized electron diffraction, High-resolution electron microscopy of quasi-crystals, Estimation of new types of recording media such as imaging plates, Surface structure analysis of silicon, Structure analysis of fine metal semiconductor particle, Nm-sized electron beam diffraction from amorphous alloys, Physics of atom clusters, Studies of plane-defects in silicon and its relationship of the optical properties, and Convergent beam electron diffraction from oxides.