Detailed structure-analysis by using electron probe

该项目的目的是（1）通过使用纳米电子探针在倒易空间中进行结构分析和（2）排除空间平均过程的纳米材料的高级高分辨率电子显微镜。在1994-1997年期间，每个研究人员都围绕本项目的上述目标，结合他们以前的工作，研究了下列课题：相干会聚束电子衍射，电子全息术，纳米电子衍射，准晶体的高分辨电子显微术，新型记录介质如成像板的评价，硅的表面结构分析，金属半导体微粒的结构分析、非晶态合金的纳米电子束衍射、原子团簇物理、硅中的面缺陷及其与光学性质关系的研究、氧化物的会聚束电子衍射。

The purposes of the project are (1) structure-analysis in reciprocal space by using nmsized electron probe and (2) advanced high resolution electron microcopy of nano material excluding the spatial averaging process. In 1994-1997, each of the investigators studied the following topics which are fitted with the their previous works and on the line of the above targets of the present project.Coherent convergent beam electron diffraction, Electron holography, Nm-sized electron diffraction, High-resolution electron microscopy of quasi-crystals, Estimation of new types of recording media such as imaging plates, Surface structure analysis of silicon, Structure analysis of fine metal semiconductor particle, Nm-sized electron beam diffraction from amorphous alloys, Physics of atom clusters, Studies of plane-defects in silicon and its relationship of the optical properties, and Convergent beam electron diffraction from oxides.