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The Establishment of C_<60> Plasma Production and Its Applications

C_<60>等离子体生产的建立及其应用

基本信息

批准号：
06402063
负责人：
SATO Noriyoshi
金额：
$ 21.12万
依托单位：
TOHOKU UNIVERSITY
依托单位国家：
日本
项目类别：
Grant-in-Aid for Scientific Research (A)
财政年份：
1994
资助国家：
日本
起止时间：
1994 至 1996
项目状态：
已结题

来源：
https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-06402063/
关键词：
Production of C_<60> Plasma Dust Plasma Negative Ion Plasma Processing Production of New Materials with Unique Functions C_<60>生成

项目摘要

An ultrafine-particle plasma consisting of electrons, positive K^+ ions, and large negative C_<60>^- ions is produced by introducing "Buckminsterfullerene, C_<60>" particles into a low-temperature (<similar or equal>0.2eV) potassium plasma column confined by a strong axial magnetic field. When a new-type sublimation oven system with jets on four sides is used in order to control a plasma structure and achieve an efficient production of the K-fullerene plasma, K^+ and a large fraction of C_<60>^- are observed to broadly distribute across the magnetic-field lines in contrast with well-confined electrons. With an increase in the C_<60>^- fraction, the electron shielding decreases, yielding clear effects on plasma collective phenomena, which are demonstrated for ion-acoustic wave propagations and drift-type instabilities. It is also observed that a local production of large negative ions C_<60>^- results in the electrostatic potential formation along the magnetic-field lines.When biases of particle-deposition substrates immersed in the plasma consisting mainly of K^+ and C_<60>^- are varied with respect to local plasma potentials.on the other hand, K and C_<60> components of thin films formed are successfully controlled. In accordance with this bias control of fluxes of K^+ and C_<60>^- ions coming into contact with the substrate, drastic changes in thin-film structure and quality such as surface roughness and electrical conductivity are observed in the formation of K-C_<60> compounds. The substrate bias is also accompanied by energy control of the incoming K^+ and C_<60>^-ions. Due to this effect of selective acceleration of the ion species, K^+ with the ionic radius larger than a fullerene six-membered-ring radius is observed to be inserted into the C_<60>^+ cage, forming an air-stable endohedral metallofullerene K@C_<60> on the substrate.

在<60>轴向强磁场作用下，将“巴克敏斯特富勒烯（Buckminsterfullerene，C）<60>“粒子引入低温（<similar or equal>0.2eV）钾等离子体柱中，产生了由电子、正K^+离子和大的负C ^-离子组成的超细粒子等离子体。当采用四面喷流的新型升华炉系统控制等离子体结构，实现K-富勒烯等离子体的高效制备时，观察到K^+和大部分C <60>^-在磁场线上广泛分布，而电子则受到很好的约束。随着C_<60>^-分数的增加，电子屏蔽减小，对等离子体集体现象产生明显的影响，这在离子声波传播和漂移型不稳定性中得到了证实。另外，还观察到大负离子C_ ^-的局部产生<60>导致了沿着磁力线的静电势的形成，而当粒子沉积基片浸没在主要由K^+和C_ ^-组成的等离子体<60>中时，偏压随局部等离子体电位的变化，<60>则成功地控制了所形成薄膜的K和C_^-组分。根据这种偏压对K^+和C_<60>^-离子与衬底接触的流量的控制，在K-C_2化合物的形成过程中观察到薄膜结构和质量（如表面粗糙度和电导率）的急剧变化<60>。衬底偏压还伴随着对进入的K^+和C ^-离子的能量控制<60>。由于这种离子选择性加速效应，离子半径大于富勒烯六元环半径的K^+被插入到C <60>^+笼中，在基底上形成空气稳定的内嵌金属富勒烯K@C<60>。