Large-diameter plasma sourcs for plasma processing

用于等离子体处理的大直径等离子体源

• 批准号: 08044118
• 负责人: SATO Noriyoshi
• 金额: $ 0.64万
• 依托单位: Tohoku university
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for international Scientific Research
• 财政年份: 1996
• 资助国家: 日本
• 起止时间: 1996 至 无数据
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-08044118/
• 关键词: Large-diameter plasma; Large-area uniform plasma; RF plasma; ECR plasma; Modified magnetron discharge; plasma materials processing; Radical measurment; Light emission spectroscopy

The productions of large-diameter, high density plasma are of crucial importance to establish a wide-area plasma processing. The object of this joint reseach is to develop new plasma sources for producing a large-diameter uniform plasma. The reseach has been proceeded by combining the plasma control techniques developed at Tohoku University for RF and ECR discharges with the diagnostic techniques developed at KAIST and KBSI,Korea, for detecting F-radicals by using a optical probe system. It is also quite important to clarify the relation between the distributions of plasma density and radical density.In order to carry out the experiment at Tohoku University, we produced a 60-cm-diameter MMT (Modifoed Magnetron Type) RF devices, where the conditions for producing a large-diameter plasma are inverstigated. It was found that the length of the RF electrode and the strenth of the magnetic field on the RF electrode are quite essential for the uniform plasma production. Is was also found that … More the production of high density plasma is possible when the RF impedance of a sub-electrode placed at the end of the machine was set at a parallel resonance with the RF frequency. We can produce a plasma of 10^<11>/cm^3 at the RF power of 500 W.Similar experiment was also carried out in a large chamber of 130 cm in diameter by using MMT RF discharge. We confirmed that a quite uniform plasma is prroduced over 120 cm in diameter with a uniformity of 5%.The profiles of F radicals in CF_4 plasmas were also measured in ECR and MMF RF discharge plasmas at Tohoku University in collaboration with the Korean staffs. The optical probe system was build up at the Tohoky University for the measurements. We found that the F radial profiles have a strong dependency on the gas pressuer. In order to confirm the relation between the actual etching profile of poli-silicon and the radical profile, the etching has been preformed under different conditions, and we found that a similar profile of etching with the radical density. Less

大直径、高密度等离子体的生产是建立广域等离子体工艺的关键。这项联合研究的目的是开发新的等离子体源来产生大直径均匀等离子体。这项研究是通过将东北大学开发的用于射频和ECR放电的等离子体控制技术与韩国KAIST和KBSI开发的利用光学探针系统检测F-自由基的诊断技术相结合进行的。为了在东北大学进行这项实验，我们制作了直径为60厘米的MMT(Modifoed Magnetron Type)射频装置，并对产生大直径等离子体的条件进行了研究。研究发现，射频电极的长度和射频电极上的磁场强度对等离子体的均匀产生是非常重要的。IS还发现…此外，当放置在机器末端的子电极的RF阻抗设置为与RF频率平行的谐振时，更有可能产生高密度等离子体。在500 W的射频功率下，我们可以产生10^&lt；11&gt；/cm~3的等离子体。我们还在一个直径为130 cm的大腔体中进行了类似的实验。我们证实，在直径120厘米以上产生了相当均匀的等离子体，其均匀度为5%。在东北大学ECR和MMF射频放电等离子体中，我们还与韩国工作人员合作测量了CF4等离子体中F自由基的分布。光学探头系统是在托霍基大学建立的，用于测量。我们发现，F径向分布与气体压强有很强的相关性。为了确定多晶硅的实际刻蚀轮廓与自由基轮廓之间的关系，我们在不同的条件下进行了刻蚀，发现随着自由基密度的增加，刻蚀轮廓相似。较少

项目成果

Yunlong Li: "Control of Plasma structure in modified magnetron-typed radio-frequency discharge" 1996 Int. Cont. on Plasma Physics. (in press). (1997)

李云龙：“改进磁控管型射频放电中等离子体结构的控制”1996 Int。

Jung-Hyung Kim: "The deposition of SiOF film with low dielectric constant in a helicon plasma" Applied Physics Letters. 68. 1507-1509 (1996)

Jung-Hyung Kim：“在螺旋等离子体中沉积低介电常数的 SiOF 薄膜”《应用物理快报》。

Yunlong Li: "Production of large-diameter plasma by modified magnetron-typed RF discharge" Proc. of 3rd Int. Cont. on Reactive Plasmas and 14th Sympo. Plasma Processing. 211-212 (1997)

李云龙：“改进磁控管式射频放电生产大直径等离子体”，Proc.

佐藤徳芳: "プロセス用大口径プラズマの生成と制御" 電子情報通信学会技術研究報告. 96. 43-50 (1996)

Noriyoshi Sato：“加工用大直径等离子体的产生和控制”IEICE 技术研究报告。 96. 43-50 (1996)。

佐藤徳芳: "成膜用プラズマの制御" 第6回ファインプロセステクノロジー・ジャパン '96セミナー. R5. 4-8 (1996)

Noriyoshi Sato：“薄膜沉积的等离子体控制”第 6 届日本精细加工技术研讨会 R5 4-8 (1996)。