Plasma Production by New Type ECR Antenna for Large Area Uniform Processing

用平面开槽ECR（ElectronCyclotronResonance）天线的实验结果表明：（1）用直径15cm的开槽天线容易产生直径大于45cm的均匀等离子体。这在实际应用中具有优势。（2）由于天线水冷系统的存在，在1kW范围内，等离子体密度随微波功率的增加而增加。讨论并设计了一种可置于真空室外的新型ECR天线结构，用于大功率工作。（3）即使在O_2、CF_4和N_2的反应等离子体中也能获得良好的等离子体均匀性。（4）在45cm直径范围内，O_2等离子体光致抗蚀剂灰化、SF_6等离子体多晶硅刻蚀、CF_4等离子体硅和二氧化硅刻蚀的均匀性均在5%以内。(6)A提出了一种新的控制电子和离子能量分布函数的方法，分别用于自由基和离子辅助化学反应的合格等离子体处理。电子和离子的温度被发现是由一个数量级的变化。

The results using plane slotted ECR (Electron Cyclotron Resonance) antenna are summarized as follows ;(1)A uniform plasma with a diameter larger than 45cm is easily produced by using a smaller slotted sntenna of 15cm in diameter. This has an advantage in a practical use.(2)The plasma density increases with the microwave power in the range of 1kW owing to the antenna water-cooling system. A new type the ECR antenna structure which can be placed outside the vacuum chamber is discussed and designed for the high power operation.(3)Good plasma uniformity is obtained even in reactive plasma with O_2, CF_4, and N_2.(4)The uniformities of the plasma processing such as photoresist ashing in O_2 plasma, polysilicon etching in SF_6 plasma, and silicon and silicon dioxide etchings in CF_4 plasma are obtained within 5% over 45cm in diameter.(6)A new method for controlling electron and ion energy distribution functions is developed for a qualified plasma processing with radical and ion-assist chemical reactions, respectively. The electron and ion temperatures are found to be varied by one order of magnitude.