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Production of large-diameter plasmas for plasma processing

Production of large-diameter plasmas for plasma processing
用于等离子体处理的大直径等离子体的生产
批准号:
07044308
负责人:
SATO Noriyoshi
金额:
$0.0万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for International Scientific Research.
财政年份:
1995
资助国家:
日本
项目状态:
已结题
起止时间:
1995 至 --

项目摘要

项目成果

SATO Noriyoshi的其他基金

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相关文献

中文摘要
翻译
大直径均匀等离子体源的发展对于实现大面积等离子体加工至关重要。为了产生这样均匀的等离子体,东北大学已经开发出一种带永磁体的平面槽天线来产生电子回旋共振(ECR)等离子体。该方法成功地提供了均匀度为(]SY.+-的大直径ECR等离子体。(3-5)%直径超过40-50厘米。此外,东北大学开发的改良磁控管型等离子体源也提供大直径均匀射频(RF)等离子体。另一方面,韩国科学技术院(Kaist)利用螺旋波加热和电感耦合等离子体生产方法在射频频率下研究高密度等离子体源。利用光学探针诊断反应等离子体中自由基密度及其分布的方法也得到了发展。该项目的主要目的是将日本东北大学和韩国科学技术院的研究成果结合起来,开发一种大直径均匀等离子体源,用于广域等离子体处理。在项目期间,我们在KAIST举办了两次研讨会,讨论了从东北大学的平面ECR天线等离子体源中检测自由基密度均匀性的问题和技术。实验证明了等离子体参数径向分布的重要性。
英文摘要
Development of large-diameter uniform plasma sources is of crucial importance for performing a wide-area plasma processing.In order to produce such a uniform plasma a plane-slotted antenna with permanent magnets has been developed to produce an electron cyclotron resonance (ECR) plasma at Tohoku University. This method successfully provides a large-diameter ECR plasma with a uniformity of (]SY.+-.])(3-5)% over a diameter of 40-50 cm. Moreover, a modified magnetron typed plasma source developed at Tohoku University also provides large-diameter uniform radio-frequency (RF) plasmas.On the other hand, high density plasma sources are studied at the Korean Advanced Institute of Science and Technology (Kaist) by using helicon wave heating and inductively coupled plasma production methods at the RF frequency. The diagnostic method employing optical probe has also been developed to evaluate the radical density and its profile in reactive plasmas.The main purpose of this project is to combine such results obtained at Tohoku University and the KAIST to develop a large-diameter uniform plasma source for the wide-area plasma processing. During the project we had two seminars at the KAIST to discuss about the problems and techniques for detecting the uniformity of radical density supplied from the plane ECR antenna plasma source at Tohoku University. The experiments show the importance of radial profile of plasma parameters.
期刊论文(10)
专著(0)
科研奖励(0)
会议论文
Shin Hiyama: "Material processing using a largediameter ECR plasma" Proceedings of The 12th Symposium on Plasma Processing. 237-240 (1995)
Shin Hiyama:“使用大直径ECR等离子体的材料处理”第12届等离子体处理研讨会论文集。
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通讯作者:
Yunlong Li: "Magnetron-typed rf plasma source" Int.Workshop on Plasmas Sources and Surface Interactions in Material Processing. 61 (1995)
李云龙:“磁控管型射频等离子体源”材料加工中等离子体源与表面相互作用国际研讨会。
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通讯作者:
Younlong Li: "Control of sputtering in a large-diameter magnetron-typed rf discharge" Proc.12th Symp.on Plasma Processing. 143-146 (1995)
李永龙:“大直径磁控管型射频放电中的溅射控制”Proc.12th Symp.on Plasma Process。
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通讯作者:
A.Takahashi: "Plasma production for control of surface reactions" Proceedings of the 33th RIEC Symposium on Photo-and Plasma-Excited Processes on Surface. 57-65 (1995)
A.Takahashi:“用于控制表面反应的等离子体生产”第 33 届 RIEC 表面光和等离子体激发过程研讨会论文集。
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共 10 条
    Large-diameter plasma sourcs for plasma processing
    • 批准号:
      08044118
    • 项目类别:
      Grant-in-Aid for international Scientific Research
    • 资助金额:
      $0.64万
    • 财政年份:
      1996
    • 负责人:
      SATO Noriyoshi
    • 依托单位:
    Development of modified magnetron-typed plasma source
    • 批准号:
      08558043
    • 项目类别:
      Grant-in-Aid for Scientific Research (A)
    • 资助金额:
      $8.96万
    • 财政年份:
      1996
    • 负责人:
      SATO Noriyoshi
    • 依托单位:
    Plasma Science
    • 批准号:
      07308036
    • 项目类别:
      Grant-in-Aid for Scientific Research (A)
    • 资助金额:
      $5.12万
    • 财政年份:
      1995
    • 负责人:
      SATO Noriyoshi
    • 依托单位:
    The Establishment of C_<60> Plasma Production and Its Applications
    • 批准号:
      06402063
    • 项目类别:
      Grant-in-Aid for Scientific Research (A)
    • 资助金额:
      $21.12万
    • 财政年份:
      1994
    • 负责人:
      SATO Noriyoshi
    • 依托单位:
    海外基金