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Production of large-diameter plasmas for plasma processing

Production of large-diameter plasmas for plasma processing
用于等离子体处理的大直径等离子体的生产
批准号:
07044308
负责人:
SATO Noriyoshi
金额:
$0.0万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for International Scientific Research.
财政年份:
1995
资助国家:
日本
项目状态:
已结题
起止时间:
1995 至 --

项目摘要

项目成果

SATO Noriyoshi的其他基金

相似基金

相关文献

中文摘要
翻译
大直径均匀等离子体源的开发对于实现大面积等离子体处理至关重要。为了产生这样的均匀等离子体,东北大学开发了一种带有永久磁铁的平面缝隙天线,用于产生电子回旋共振(ECR)等离子体。该方法成功地提供了具有(]SY. ±.])均匀性的大直径ECR等离子体。(3-5)%,直径为40-50 cm。此外,东北大学开发的改良磁控管型等离子体源也可以提供大直径均匀的射频(RF)等离子体。另一方面,韩国科学技术高等研究院(Kaist)利用螺旋波加热和感应耦合等离子体方法,在RF频率下研究了高密度等离子体源。本研究课题的主要目的是将东北大学和韩国科学技术院的研究成果联合收割机结合起来,开发用于广域等离子体加工的大直径均匀等离子体源。在项目期间,我们在KAIST举办了两次研讨会,讨论东北大学平面ECR天线等离子体源提供的自由基密度均匀性检测的问题和技术。实验表明了等离子体参数径向分布的重要性。
英文摘要
Development of large-diameter uniform plasma sources is of crucial importance for performing a wide-area plasma processing.In order to produce such a uniform plasma a plane-slotted antenna with permanent magnets has been developed to produce an electron cyclotron resonance (ECR) plasma at Tohoku University. This method successfully provides a large-diameter ECR plasma with a uniformity of (]SY.+-.])(3-5)% over a diameter of 40-50 cm. Moreover, a modified magnetron typed plasma source developed at Tohoku University also provides large-diameter uniform radio-frequency (RF) plasmas.On the other hand, high density plasma sources are studied at the Korean Advanced Institute of Science and Technology (Kaist) by using helicon wave heating and inductively coupled plasma production methods at the RF frequency. The diagnostic method employing optical probe has also been developed to evaluate the radical density and its profile in reactive plasmas.The main purpose of this project is to combine such results obtained at Tohoku University and the KAIST to develop a large-diameter uniform plasma source for the wide-area plasma processing. During the project we had two seminars at the KAIST to discuss about the problems and techniques for detecting the uniformity of radical density supplied from the plane ECR antenna plasma source at Tohoku University. The experiments show the importance of radial profile of plasma parameters.
期刊论文(10)
专著(0)
科研奖励(0)
会议论文
Shin Hiyama: "Material processing using a largediameter ECR plasma" Proceedings of The 12th Symposium on Plasma Processing. 237-240 (1995)
Shin Hiyama:“使用大直径ECR等离子体的材料处理”第12届等离子体处理研讨会论文集。
DOI: --
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通讯作者:
Yunlong Li: "Magnetron-typed rf plasma source" Int.Workshop on Plasmas Sources and Surface Interactions in Material Processing. 61 (1995)
李云龙:“磁控管型射频等离子体源”材料加工中等离子体源与表面相互作用国际研讨会。
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通讯作者:
Younlong Li: "Control of sputtering in a large-diameter magnetron-typed rf discharge" Proc.12th Symp.on Plasma Processing. 143-146 (1995)
李永龙:“大直径磁控管型射频放电中的溅射控制”Proc.12th Symp.on Plasma Process。
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通讯作者:
A.Takahashi: "Plasma production for control of surface reactions" Proceedings of the 33th RIEC Symposium on Photo-and Plasma-Excited Processes on Surface. 57-65 (1995)
A.Takahashi:“用于控制表面反应的等离子体生产”第 33 届 RIEC 表面光和等离子体激发过程研讨会论文集。
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共 10 条
    Large-diameter plasma sourcs for plasma processing
    • 批准号:
      08044118
    • 项目类别:
      Grant-in-Aid for international Scientific Research
    • 资助金额:
      $0.64万
    • 财政年份:
      1996
    • 负责人:
      SATO Noriyoshi
    • 依托单位:
    Development of modified magnetron-typed plasma source
    • 批准号:
      08558043
    • 项目类别:
      Grant-in-Aid for Scientific Research (A)
    • 资助金额:
      $8.96万
    • 财政年份:
      1996
    • 负责人:
      SATO Noriyoshi
    • 依托单位:
    Plasma Science
    • 批准号:
      07308036
    • 项目类别:
      Grant-in-Aid for Scientific Research (A)
    • 资助金额:
      $5.12万
    • 财政年份:
      1995
    • 负责人:
      SATO Noriyoshi
    • 依托单位:
    The Establishment of C_<60> Plasma Production and Its Applications
    • 批准号:
      06402063
    • 项目类别:
      Grant-in-Aid for Scientific Research (A)
    • 资助金额:
      $21.12万
    • 财政年份:
      1994
    • 负责人:
      SATO Noriyoshi
    • 依托单位:
    海外基金