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Preparation of functionally graded optical filter

功能梯度滤光片的制备

基本信息

批准号：
07405029
负责人：
HIRAI Toshio
金额：
$ 9.22万
依托单位：
Tohoku University
依托单位国家：
日本
项目类别：
Grant-in-Aid for Scientific Research (A)
财政年份：
1995
资助国家：
日本
起止时间：
1995 至 1996
项目状态：
已结题

来源：
https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-07405029/
关键词：
SiO_2 thin film TiO_2 thin film optical multilayr Rugate filter helicon plzma functionally graded material ヘリコンスパッタ光学フィルター SiO_2 TiO_2 薄膜多層膜

项目摘要

Dielectric multilayres are used for bandpass filters in optical communication and for antireflection coatings in solar cells. In these cases.optical losses should be lowered by smoothing interfaces and reducing defects in films. In a helicon sputtering method, high density plasma can be maintained under a low gas pressure. Sputtering ions keep their kinetic energy due to a long mean-free-pass, which enables one to elongate a target-substrate distance. Therefore less plasma-damaged films having a smooth surface can be obtained.In the present work, silica/titania multilayres or Rugert filter were prepared by helicon sputtering. The structure and optical properties of films were measured. Effect of helicon wave power was studied with a plasma-emission spectrometer.The plasma emission intensity increased with increasing radio frequency (RF) power, but plasma density was almost saturated at more than 100W.Thus the RF power was fixed at 100W.Refractive index of titania film decreased from 2.42 to 2.35 with decreasing total gas pressure, but that of silica film was constant (1.48). Both silica and titania films were amorphous. A silica-titania multilayr whose reflection peak is 800nm was designed. It was confirmed that the multilayr had almost the same transmittance spectrum as that of calculation. A transmission electron micrograph showed that the multilayred films had smooth interface.

介质多层用于光通信中的带通滤波器和太阳能电池中的减反射涂层。在这些情况下。应通过平滑界面和减少薄膜中的缺陷来降低光损耗。在螺旋溅射方法中，高密度等离子体可以在低气压下保持。溅射离子保持他们的动能由于一个很长的平均自由通过，这使得一个延长目标-衬底距离。因此，可以得到具有光滑表面的等离子体损伤较少的薄膜。本文采用螺旋溅射法制备了二氧化硅/二氧化钛多层或Rugert滤光片。测量了薄膜的结构和光学性能。利用等离子体发射光谱仪研究了螺旋波能的影响。等离子体发射强度随射频功率的增加而增加，但在100W以上等离子体密度基本饱和。因此射频功率固定为100W。随着总气压的降低，二氧化钛薄膜的折射率从2.42下降到2.35，而二氧化硅薄膜的折射率保持不变（1.48）。二氧化硅和二氧化钛薄膜都是无定形的。设计了一种反射峰为800nm的二氧化硅-二氧化钛多层膜。结果表明，该多层膜的透射光谱与计算值基本一致。透射电子显微照片显示多层膜具有光滑的界面。