Design and preparation of ferroelectric-metal nano-FGM multi-layer films
铁电金属纳米FGM多层薄膜的设计与制备
基本信息
- 批准号:11355027
- 负责人:
- 金额:$ 17.54万
- 依托单位:
- 依托单位国家:日本
- 项目类别:Grant-in-Aid for Scientific Research (A).
- 财政年份:1999
- 资助国家:日本
- 起止时间:1999 至 2000
- 项目状态:已结题
- 来源:
- 关键词:
项目摘要
The dielectric and metal which were used were set to TiO_2, or SiO_2 and Au, respectively, and produced the compound thin film using the Helicon beam sputtering method.First, TiO_2-SiO_2 thin film was produced as a dielectric-dielectric film based on an functionally graded material design. The obtained thin film showed clearly that it has the narrow-band-pass filter structure which penetrates only the light of the specific wavelength.Next, the film of a dielectric and metal was produced. It was clealy that it is a film with each flat and smooth and uniform film.Quntum dot which consists of a dielectric and a metaled multilayer film was made by Helicon plasma sputtering method. Consequently, the grasp of conditions which can check a deposit of a golden fine crystal in a matrix SiO_2 was completed.By producing the film of multilayer structure, the peculiar absorption in specific wavelength was observed according to the number of laminating.Multi-effects, such as discovery of a new nonlinear-optics phenomenon and the nonlinear characteristic, are expectable by producing the multilayer film which carried out the laminating of the particle of different metal by turns.
所用的电介质和金属分别设置为TiO_2或SiO_2和Au,采用螺旋束溅射法制备复合薄膜。首先,基于功能梯度材料设计,制备TiO_2-SiO_2薄膜作为介电-介电薄膜。所得薄膜清楚地表明,它具有仅透过特定波长光的窄带通滤光片结构。接下来,制备电介质和金属薄膜。用螺旋等离子体溅射法制备了由介质膜和金属化多层膜组成的量子点。通过制作多层结构的膜,观察到了与层叠次数相应的特定波长的特殊吸收,发现了新的非线性光学现象和非线性特性等多重效果,通过制造将不同金属的粒子依次层压的多层膜,
项目成果
期刊论文数量(12)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
王 新栄: "ヘリコンスパッタ法により作製したTiO_2/SiO_2多層膜の微細構造および光学特性"粉体および粉末冶金. 46. 180-184 (1999)
王新荣:“螺旋溅射制备TiO_2/SiO_2多层薄膜的显微结构和光学性能”粉末与粉末冶金。 46. 180-184 (1999)
- DOI:
- 发表时间:
- 期刊:
- 影响因子:0
- 作者:
- 通讯作者:
X.R.Wang: "Fabrication of a 33-layer optical reflection filter with stepwise graded refractive index profiles"J.Mater.Res.. 15. 274-277 (2000)
X.R.Wang:“具有阶梯式折射率分布的33层光学反射滤光片的制作”J.Mater.Res.. 15. 274-277 (2000)
- DOI:
- 发表时间:
- 期刊:
- 影响因子:0
- 作者:
- 通讯作者:
X.R.Wang: "Design and experimental approach of optical reflection filters with graded refractive index profiles"J.Vac.Sci.Technol.. A,17. 206-211 (1999)
王X.R.王:“具有渐变折射率分布的光学反射滤光片的设计与实验方法”J.Vac.Sci.Technol..A,17。
- DOI:
- 发表时间:
- 期刊:
- 影响因子:0
- 作者:
- 通讯作者:
X.R.Wang: "Design and preparation of a 33-layer optical reflection filter of TiO_2-SiO_2 system"J.Vac.Sci.Technol.. A. 933-937 (2000)
X.R.Wang:“TiO_2-SiO_2体系33层光学反射滤光片的设计与制备”J.Vac.Sci.Technol..A.933-937(2000)
- DOI:
- 发表时间:
- 期刊:
- 影响因子:0
- 作者:
- 通讯作者:
X.R.Wang: "Design and preparation of a 33-layer optical reflection filter of TiO_2-SiO_2 system"Mater.Res.Bull.. 35. 619-628 (2000)
X.R.Wang:“TiO_2-SiO_2体系33层光学反射滤光片的设计与制备”Mater.Res.Bull.. 35. 619-628 (2000)
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- 影响因子:0
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HIRAI Toshio其他文献
HIRAI Toshio的其他文献
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{{ truncateString('HIRAI Toshio', 18)}}的其他基金
Preparation of functionally graded optical filter
功能梯度滤光片的制备
- 批准号:
07405029 - 财政年份:1995
- 资助金额:
$ 17.54万 - 项目类别:
Grant-in-Aid for Scientific Research (A)
Preparation of Fuctinally Graded Materials in high Energy Field of Plasma
等离子体高能场功能梯度材料的制备
- 批准号:
06555191 - 财政年份:1994
- 资助金额:
$ 17.54万 - 项目类别:
Grant-in-Aid for Developmental Scientific Research (B)
Structural controlling in nano-scale and high-functionalization for multi-component ferroelectric oxide films by chemical vapor deposition
化学气相沉积多组分铁电氧化物薄膜的纳米级和高功能化结构控制
- 批准号:
05403017 - 财政年份:1993
- 资助金额:
$ 17.54万 - 项目类别:
Grant-in-Aid for General Scientific Research (A)
Studies on chemical Vapor Deposition of High-temperature Superconductor for Wire Application
线材用高温超导体化学气相沉积研究
- 批准号:
02555146 - 财政年份:1990
- 资助金额:
$ 17.54万 - 项目类别:
Grant-in-Aid for Developmental Scientific Research (B)
New processes on the structure-controls and property-evaluation of ceramics
陶瓷结构控制和性能评价的新工艺
- 批准号:
60303015 - 财政年份:1985
- 资助金额:
$ 17.54万 - 项目类别:
Grant-in-Aid for Co-operative Research (A)














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