Design and preparation of ferroelectric-metal nano-FGM multi-layer films

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The dielectric and metal which were used were set to TiO_2, or SiO_2 and Au, respectively, and produced the compound thin film using the Helicon beam sputtering method.First, TiO_2-SiO_2 thin film was produced as a dielectric-dielectric film based on an functionally graded material design. The obtained thin film showed clearly that it has the narrow-band-pass filter structure which penetrates only the light of the specific wavelength.Next, the film of a dielectric and metal was produced. It was clealy that it is a film with each flat and smooth and uniform film.Quntum dot which consists of a dielectric and a metaled multilayer film was made by Helicon plasma sputtering method. Consequently, the grasp of conditions which can check a deposit of a golden fine crystal in a matrix SiO_2 was completed.By producing the film of multilayer structure, the peculiar absorption in specific wavelength was observed according to the number of laminating.Multi-effects, such as discovery of a new nonlinear-optics phenomenon and the nonlinear characteristic, are expectable by producing the multilayer film which carried out the laminating of the particle of different metal by turns.