Development of MOS Capacitor Dissolved Oxygen Sensor for Use in High-Temperature Solutions
Development of MOS Capacitor Dissolved Oxygen Sensor for Use in High-Temperature Solutions
批准号:
07555214
负责人:
HARA Nobuyoshi
金额:
$4.74万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (B)
财政年份:
1995
资助国家:
日本
项目状态:
已结题
起止时间:
1995 至 1996
中文摘要
基于金属氧化物半导体(MOS)和电解质氧化物半导体(EOS)器件的新型溶解氧传感器已被开发出来,用于测量高温高压水溶液中的氧浓度。主要研究成果如下:1.设计并搭建了可用于测量MOS和EOS电容传感器高温响应特性的系统。PT-PtO_x电极对O2浓度变化的响应速度快,在高温下具有较高的耐腐蚀性。以单晶硅为半导体的多孔铂-MOS电容传感器在303-363K温度范围内,响应电压与对数[DO]浓度呈线性关系,但在423K以上出现裂纹。将体铂电极与二氧化钛单晶半导体电极相结合的铂-状态方程传感器表现出与铂-MOS传感器相同的DO响应特性,并且在423K.5以上仍具有良好的稳定性。得到了PtEOS传感器的DO浓度与响应电压之间的关系曲线。
英文摘要
New dissolved oxygen sensors based on metal-oxide-semiconductor (MOS) and electrolyte-oxide-semiconductor (EOS) devices have been developed for the measurement of oxygen concentration in high-temperature and high-pressure aqueous solutions. The results are summarized as follows ;1. The system that can be served for the measurement of response characteristics of MOS and EOS capacitor sensors at elevated temperatures was designed and constructed.2. Pt-PtO_x electrodes displayd a rapid response to changes in O_2 concentration and had a high resistance against corrosion at elevated temperatures.3. The porous Pt-MOS capacitor sensor fabricated using a single crystal silicon as a semiconductor showed a linear relationship between the response voltage and log [DO concentration] at temperatures of 303-363K.However, this sensor suffered from cracking at temperatures above 423K.4. The Pt-EOS sensor combining a bulk Pt electrode with a semiconductor electrode of TiO_2 single crystal displayd the same DO response characteristics as the Pt-MOS sensor, and had a good stability even at temperatures above 423K.5. Calibration curves, which provide the relationships between the DO concentration and the response voltage of the Pt-EOS sensor, were obtained.
期刊论文(2)
专著(0)
科研奖励(0)
会议论文
Nobuyoshi Hara: "Dissolved Hydrogen and Oxygen Sensors Using Semiconductor Devices" Materia Japan. 34. 1221-1226 (1995)
Nobuyoshi Hara:“使用半导体器件的溶解氢和氧传感器”Materia Japan。
DOI:
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发表时间:
期刊:
影响因子:
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作者:
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通讯作者:
原 信義: "半導体デバイス型DHおよびDOセンサ" まてりあ. 34. 1221-1226 (1995)
Nobuyoshi Hara:“半导体器件类型 DH 和 DO 传感器”Materia。 34. 1221-1226 (1995)
DOI:
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发表时间:
期刊:
影响因子:
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作者:
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通讯作者:
Development of CWD process for surface treatment of magnesium
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财政年份:2010
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依托单位:
海外基金