TRIAL MANUFACTURE OF SYNTHETIC APPARATUS FOR NANO SCALELAYERED ADVANCED MATERIALS BY PULSELASER

脉冲激光纳米级层状先进材料合成装置的试制

基本信息

批准号：
07555225
负责人：
SATO Nobuaki
金额：
$ 11.78万
依托单位：
Tohoku University
依托单位国家：
日本
项目类别：
Grant-in-Aid for Scientific Research (A)
财政年份：
1995
资助国家：
日本
起止时间：
1995 至 1996
项目状态：
已结题

来源：
https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-07555225/
关键词：
Pulse laser Advanced materials Thin film Oxide Sulfide Multi-layred film

项目摘要

Trial manufacture of Synthetic apparatus for nano scale layred advanced materials by pulse laser was made. In this Physical year, a deposition monitor was set in a high vacuum reaction chamber which was manufactured in last year. This system enables in situ measurement of the thickness of film deposited on a substrate by laser ablation reaction. Synthesis of multi-layred film materials was examined by repeating the ablation reactions using targets of different compounds, such as metal, oxide and sulfide. Pellets of Ta and Ta_2O_5 were used as target. The Nd : YAG pulse laser with wavelength 10.64 nm was used as a laser light source. First, deposition of metallic Ta or Ta_2O_5 film on substrate was examined by pulse laser ablation using Ta or Ta_2O_5, respectively. SEM observation and EPMA analysis of the obtained films were made. The thickness of film varied from the order of nm to mum by changing pulse frequency from 1Hz to 100 Hz. The layred thin film which has a layr structure of metal-oxide-metal-oxide was obtained when the laser ablation was applied on the different targets alternately. Furthermore, It was also found that film thickness of different materials of layred film was controlled by changing repetition cycles of laser irradiation on each target. Structures and compositions of oxide films odtained by laser ablation of oxide target and by oxidation of metal film were compared

通过脉冲激光器制造了纳米量表的合成设备的试验制造。在这一年中，在去年制造的高真空反应室中设置了沉积监测器。该系统可以原位测量通过激光消融反应沉积在底物上的膜厚度。通过使用金属，氧化物和硫化物等不同化合物的靶标重复消融反应来检查多层膜材料的合成。将TA和TA_2O_5的颗粒用作目标。 ND：具有波长10.64 nm的YAG脉冲激光器用作激光光源。首先，分别使用TA或TA_2O_5分别检查了金属TA或TA_2O_5膜在底物上的沉积。对获得的膜进行了SEM观察和EPMA分析。通过将脉冲频率从1Hz更改为100 Hz，膜的厚度从NM到MUM的顺序不等。当激光消融在不同靶标上时，获得了具有金属氧化物 - 金属氧化的Layr结构的铺层薄膜。此外，还发现，通过改变每个目标对激光照射的重复周期来控制不同层的不同材料的膜厚度。比较了通过激光消融氧化物靶标和金属膜的氧化的结构和组成