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Development of cold plasma torch for dry process, under atmospheric pressure

Development of cold plasma torch for dry process, under atmospheric pressure
开发用于大气压下干法工艺的冷等离子炬
批准号:
07555268
负责人:
KOINUMA Hideomi
金额:
$9.54万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (A)
财政年份:
1995
资助国家:
日本
项目状态:
已结题
起止时间:
1995 至 1997

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中文摘要
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英文摘要
Various devices which generated the cold plasma under the atmospheric pressure were developed in this research, and the application of the new process of plasma enforceable in air was examined. It aimed to clarify the essence of the low temperature atmosphere open plasma through the examination of the control parameter. of the plasma diagnosis and the electrical discharge shape.Various shape which arrived from the beam of 1 mm or less like the desk of the seat of 2×50mm and 50mm in the diameter was possessed by this research, the plasma generator which was able to discharge the electrical discharge gas over 100℃ or less from the temperature 500℃ into atmospheric was made, and the characteristic was clarified.The possibility of the ceramics thin film piling up and the etching was clarified as an application of this new low temperature atmosphere open plasma. to the firstMoreover, it was not easy to process in the vacuum chamber, and developed an effective process the village plasma surface treatment such as rubbers and the polymer films.
期刊论文(19)
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会议论文
DOI: --
发表时间:
期刊:
影响因子: --
作者: []
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DOI: --
发表时间: 1996
期刊: Proc. the 3rd Conf. on Science & Technology
影响因子: --
作者: [B. J. LEE, et al]
通讯作者: et al
プラズマ化学とセラミックス
等离子体化学和陶瓷
DOI: --
发表时间: 1996
期刊: セラミックスデータブック 96別冊
影响因子: --
作者: [鯉沼秀臣, 堀内賢雄]
通讯作者: 堀内賢雄
H.Koinuma et al.: "Highly Dielectric Amorphous TiO_2 Films Prepared in Air by Plasma CVD" Proceeding of IUMRS 3rd International Conference in Asia. 987-992 (1995)
H.Koinuma 等人:“通过等离子体 CVD 在空气中制备高介电非晶 TiO_2 薄膜”IUMRS 第三届亚洲国际会议论文集。
DOI: --
发表时间:
期刊:
影响因子: --
作者: []
通讯作者:
16
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    • 批准号:
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    • 项目类别:
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    • 资助金额:
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    • 财政年份:
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      1998
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    • 批准号:
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    • 项目类别:
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    • 资助金额:
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      1998
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