Super-Modulus Effect of Transition Metal Nidride Multilayrs and Its Structural Origin

过渡金属氮化物多层膜的超模量效应及其结构起源

• 批准号: 08650769
• 负责人: NAKAYAMA Noriaki
• 金额: $ 1.54万
• 依托单位: Yamaguchi Univeristy
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (C)
• 财政年份: 1996
• 资助国家: 日本
• 起止时间: 1996 至 1997
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/grant/KAKENHI-PROJECT-08650769/
• 关键词: Micro Haardness; Multilayrs; Transition Metal Nitrides; Chromium Nitride; Carbon Nitride; Titanium Nitride; X-ray Diffraction; Reactive Sputtering; 金属窒化物; 反応スパークリング

Based on the investigation of nonstoichiometric CrN prepared by reactive sputtering, we have prepared CrN/CN and CrN/TiN multilayrs and studied their structre and micro hardness. As for CrN/CN multilyers, the maximum hardness was observed when samples were prepared on the room temperature substrate with the artificial period of 3.0nm and CrN : CN thickness ratio of 3 : 1. The value of hardness is 1.2 times of CrN films and is 1.5 times of CN films prepared under the same comdition. The hardness values are strongly dependent on the CrN : CN thickness ratio and the aahardness decreases with the increase of the artificial period. Highly [111] oriented CrN/TiN multilayrs were obtained. However, the intermixing layrs at the interfaces were detected from the x-ray diffraction analysis. No enhancement of hardness was observed for CrN/TiN multilayrs.

在研究反应溅射制备非化学计量比CrN的基础上，制备了CrN/CN和CrN/TiN多层膜，并对其结构和显微硬度进行了研究。对于CrN/CN多层膜，在人工周期为3.0 nm、CrN/CN厚度比为3：1的室温衬底上制备的样品的硬度最高，是相同条件下制备的CrN膜的1.2倍和CN膜的1.5倍。硬度值强烈依赖于CrN：CN的厚度比，硬度随人工周期的增加而降低。得到了高度择优取向的CrN/TiN多层膜。然而，从x射线衍射分析中检测到了界面处的混合层。CrN/TiN多层膜的硬度没有明显提高。

项目成果

Y.Tsuchiya: "Exchange anisotropy of CrNx/FeNy/CrNx trilayer thin films prepared by reactive sputtering" Materials Transactions, JIM. 38. 91-98 (1997)

Y.Tsuchiya：“通过反应溅射制备的 CrNx/FeNy/CrNx 三层薄膜的交换各向异性”Materials Transactions，JIM。

Y.Tsuchiya: "Non-stoichiometry and antiferromagnetic phase transition of Nacl-type CrN thin films prepared by reactive sputtering" Materials Transactions,JIM. 37. 121-129 (1996)

Y.Tsuchiya：“反应溅射制备的 Nacl 型 CrN 薄膜的非化学计量和反铁磁相变”Materials Transactions，JIM。

Y.Tsuchiya: "Non-stoichiometry and antiferromagnetic phase transition of NaCl-type CrN thin films prepared by reactive sputtering" Materials Transactions, JIM. 37. 121-129 (1996)

Y.Tsuchiya：“反应溅射制备的 NaCl 型 CrN 薄膜的非化学计量和反铁磁相变”Materials Transactions，JIM。

Y.Tsuchiya: "Exchange anisotropy of CrNx/FeNy/CrNx trilayer thin films prepared by reactive sputtering" Materials Transactions,JIM. 38. 91-98 (1997)

Y.Tsuchiya：“反应溅射制备的 CrNx/FeNy/CrNx 三层薄膜的交换各向异性”Materials Transactions，JIM。

Y.Tsuchiya, K.Kosuge, Y.Ikeda, T.Shigematsu, S.Yamaguchi and N.Nakayama: "Non-stoichiometry and antiferromagnetic phase transition of NaCl-type CrN thin films prepared by reactive sputtering" Materials Trans., JIM. Vol.38. 91-98 (1997)

Y.Tsuchiya、K.Kosuge、Y.Ikeda、T.Shigematsu、S.Yamaguchi 和 N.Nakayama：“反应溅射制备的 NaCl 型 CrN 薄膜的非化学计量和反铁磁相变”Materials Trans.，JIM。