Super-Modulus Effect of Transition Metal Nidride Multilayrs and Its Structural Origin

在研究反应溅射法制备非化学计量比CrN的基础上，制备了CrN/CN和CrN/TiN多层膜，并对其结构和显微硬度进行了研究。对于CrN/CN多层膜，当人工周期为3.0nm，CrN：CN厚度比为3：1时，室温下制备的样品硬度最高。硬度是相同条件下制备的CrN膜的1.2倍，是CN膜的1.5倍。硬度值强烈地依赖于CrN：CN厚度比，并且aa硬度随着人工周期的增加而减小。获得了高度[111]取向的CrN/TiN多层膜。然而，从X射线衍射分析中检测到界面处的混合层。CrN/TiN多层膜的硬度没有提高。

Based on the investigation of nonstoichiometric CrN prepared by reactive sputtering, we have prepared CrN/CN and CrN/TiN multilayrs and studied their structre and micro hardness. As for CrN/CN multilyers, the maximum hardness was observed when samples were prepared on the room temperature substrate with the artificial period of 3.0nm and CrN : CN thickness ratio of 3 : 1. The value of hardness is 1.2 times of CrN films and is 1.5 times of CN films prepared under the same comdition. The hardness values are strongly dependent on the CrN : CN thickness ratio and the aahardness decreases with the increase of the artificial period. Highly [111] oriented CrN/TiN multilayrs were obtained. However, the intermixing layrs at the interfaces were detected from the x-ray diffraction analysis. No enhancement of hardness was observed for CrN/TiN multilayrs.