Preparation and Caracterization of Electrodeposited Magnetic Multilayrs

电沉积磁性多层膜的制备与表征

• 批准号: 06452328
• 负责人: HAYASHI Yasunori
• 金额: $ 4.8万
• 依托单位: KYUSHU UNIVERSITY
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for General Scientific Research (B)
• 财政年份: 1994
• 资助国家: 日本
• 起止时间: 1994 至 1995
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/en/grant/KAKENHI-PROJECT-06452328/
• 关键词: Metallic Artificial Superlattice; Electrodeposition; Magnetic Mutilayr; Giant Magnetoresistance; Reflection Electron Microscopy; 電解析出; 金属多層膜; コバルト; 白金

Fabrication of atomically controlled Co/Pt and Co/Cu magnetic multilayrs by electrodeposition has been discussed on the basis of a nucleation-growth mechanism and experimental observations. Reflection electron microscopy studies of electrodeposited Co, Cu/Pt (111) ultrathin layrs have revealed a heteroepitaxial and simultaneous multinuclear multilayr growth in a range from seversl up to some ten monolayr coverages at room temperature, which has been dependent upon the crystallization overpotential. Cross-sectional transmission electron microscopy observations, X-ray diffraction, and Auger and photoelectron spectroscopy experiments have provided direct evidence for composition modulation across successive layrs in Co/Pt and Co/Cu nanometer-multilayred structures prepared by electrodeposition under potential control. The growth and structure of the multilayrs have been dependent upon the deposition overpotential. "Giant" magnetoresistance of more than 20% has been observed at room temperature in a (111) textured Co/Cu multilayred nanostructure containing a nominal Cu spacer layr thickness of 10 nm. This value is nearly comparable to those previously reported in vapor-deposited multilayrs. Further studies on the crystallization kinetics of nucleation and growth are necessary to obtain improved quality of the nanometer-multilayred structures. Electrodeposition under precise crystallization overpotential and current density control will be a highly competitive technique for the preparation of magnetic multilayrs, and has a potential to create multilayred structures exhibiting unusual magnetic properties previously unavailable by vapor-phase deposition.

根据成核-生长机理和实验观察，讨论了原子控制的Co/Pt和Co/Cu磁性多层膜的电沉积制备。对电沉积Co，Cu/Pt（111）多层膜的反射电子显微镜研究表明，在室温下，从几层到十几层单层覆盖范围内，存在异质外延同时多核多层膜生长，这取决于结晶过电位。横截面透射电子显微镜观察，X-射线衍射，俄歇和光电子能谱实验提供了直接的证据，在Co/Pt和Co/Cu纳米多层结构的电沉积电位控制下制备的连续层的组成调制。多层膜的生长和结构依赖于沉积过电位。在室温下，在Cu间隔层厚度为10 nm的（111）织构Co/Cu多层纳米结构中观察到了大于20%的“巨”磁电阻。该值几乎与先前在气相沉积多层膜中报道的值相当。进一步研究成核和生长的结晶动力学是必要的，以获得更好的质量的纳米多层结构。精确的结晶过电位和电流密度控制下的电沉积将是一个极具竞争力的磁性多层膜的制备技术，并有可能创建多层结构，表现出不寻常的磁性能以前无法通过气相沉积。

项目成果

Yukimi Jyoko: "Characterization of Electrodeposited Cobalt/Platinum (111) Ultrathin Films and Multilayers" Mater. Res. Soc. Proc.382. 167-172 (1995)

Yukimi Jyoko：“电镀钴/铂 (111) 超薄膜和多层的表征”。

Yukimi Jyoko: "Characterization of Electrodeposited Cobalt/Platinum(111) U1trathin Films and Multilayers" Mater. Res. Soc. Proc.382. 167-172 (1995)

Yukimi Jyoko：“电镀钴/铂(111) U1trathin 薄膜和多层的表征”。

Satoshi Kashiwabara: "Preparation of Pt/Co Multilayrs by Electrocrystallization" J.Surf. Finish. Soc.Jpn. Vo1.46 No.6. 577-578 (1995)

Satoshi Kashiwabara：“通过电结晶制备 Pt/Co 多层膜”J.Surf。

Yukimi Jyoko: "Preparation and Characterization of Electrodeposited Pt/Co Multilayers" J. Magn. Magn. Mater.(in press).

Yukimi Jyoko：“电镀 Pt/Co 多层膜的制备和表征”J. Magn。

Yukimi Jyoko: "Preparation and Characterization of Electrodeposited Pt/Co Multilayers" J. Magn. Magn. Mater.,. (in press).

Yukimi Jyoko：“电镀 Pt/Co 多层膜的制备和表征”J. Magn。