Research of MOS-Type Single Election Transistor (SET) with Very Thin Dielectric Film
Research of MOS-Type Single Election Transistor (SET) with Very Thin Dielectric Film
批准号:
10650310
负责人:
MATSUO Naoto
金额:
$2.18万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (C)
财政年份:
1998
资助国家:
日本
项目状态:
已结题
起止时间:
1998 至 1999
中文摘要
The purpose of this research isto propose a new single election transistor utilizing SiResonant Tunneling MOS Transistor (SRTMOST) with thin dielectric film. During this term,我们明确了following two points. First,the direct tunneling (DT) mechanism of very thin SiO D22 film fabricated on n-type or p-typeSi(100) substrate was examined theoretically and experimentally by considering the Fermi-energy ofpolysi electrode, multi-valley effects of Si substrate (degeneracy),inelastic scattering and surface quantization effect. Second,the device phisics of SRTMOST was examined theoretically.The ultra high vacuum scanning tunnelingmicroscopy (STM) was introduced to form both the wile -like and dot-like dielectric films. A part ofthe research grant was used to fabricate the STM。
英文摘要
The purpose of this research is to propose a new single election transistor (SET) utilizing Si Resonant Tunneling MOS Transistor (SRTMOST) with very thin dielectric film. During this term, we clarified the following two points. First, the direct tunneling (DT) mechanism of very thin SiOィイD22ィエD2 film fabricated on n-type or p-type Si(100) substrate was examined theoretically and experimentally by considering the Fermi-energy of poly-Si electrode, multi-valley effects of Si substrate (degeneracy), inelastic scattering and surface quantization effect. Second, the device phisics of SRTMOST was examined theoretically.The ultra high vacuum scanning tunneling microscopy (STM) was introduced to form both the wire-like and dot-like dielectric films. A part of the research grant was used to fabricate the STM.
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N. Matsuo, T. Miura, H. Fujiwara and T. Miyoshi: "Effects of Electric Field Concentration on Resonant Tunneling of Asymmetric Oxide-Nitride-Oxide Films"Solid State Electronics. vol. 43, no. 3. 653-657 (1999)
N. Matsuo、T. Miura、H. Fujiwara 和 T. Miyoshi:“电场集中对不对称氧化物-氮化物-氧化物薄膜谐振隧道效应的影响”固态电子学。
DOI:
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影响因子:
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通讯作者:
松尾直人: "Study of Crystal Growth MechaLism for Poly-Si Film Prepared by ELA"Digest of Technical Papers of AM-LCD. 145-148 (1998)
Naoto Matsuo:“ELA 制备的多晶硅薄膜的晶体生长机制的研究”AM-LCD 技术论文摘要 145-148 (1998)。
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通讯作者:
松尾直人: "Analysis of Direct Tunneling for Thin SiO_2 Film" Japanese Journal of Applied Physics. (発表予定). (1999)
Naoto Matsuo:“SiO_2 薄膜的直接隧道分析”,日本应用物理学杂志(即将出版)。
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通讯作者:
松尾直人: "Effects of Electric Field Concerntration on Resonant Tunneling of Asymmetric Oxide-Nitride-Oxide Films"Solid State Electronics. vol.43,no.3. 653-657 (1999)
Naoto Matsuo:“电场集中对不对称氧化物-氮化物-氧化物薄膜谐振隧道的影响”,《固态电子学》第 43 卷,第 653-657 期。
DOI:
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发表时间:
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影响因子:
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作者:
[]
通讯作者:
松尾直人: "Study of Crystal Growth Mechanism for Poly-Si Film Prepared by ELA" Digest of Technical Papers of AM-LCD. 145-148 (1998)
Naoto Matsuo:“ELA 制备的多晶硅薄膜的晶体生长机制的研究”AM-LCD 技术论文摘要 145-148 (1998)。
DOI:
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作者:
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