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A Study of Magnetic Interaction Between Magnetic Layers in Laminated Films

A Study of Magnetic Interaction Between Magnetic Layers in Laminated Films
层压薄膜中磁性层之间磁相互作用的研究
批准号:
10650691
负责人:
KOHMOTO Osamu
金额:
$0.7万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (C)
财政年份:
1998
资助国家:
日本
项目状态:
已结题
起止时间:
1998 至 1999

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中文摘要
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英文摘要
Four types of the magnetic films has been studied.(1) Single-layer Ni Films : Dependencies of the saturation magnetization, coercive force remanence ratio and perpendicular magnetic anisotropy in sputtered Ni films on the film thickness (100 and 300 nm) and Ar pressure (3-50 mTorr) have been studied.(2) Single-layer Ni-O films prepared by sputtering in Ar+OィイD22ィエD2 atmosphere : Single phase NiO films are obtained below the oxygen partial pressure (OィイD22ィエD2/(Ar+OィイD22ィエD2)) of 9%. Lattice constant (a) and axis angle (α) of the Ni-O films have been studied. With increase in OィイD22ィエD2 pressure, the two values of a and α become close to those of the bulk. Saturation magnetization, coercive force, remanence ratio and electrical resistivity (ρ) has been studied. The NiO films are not stoichiometric composition. Oxygen deficient value (γ) in NiィイD21-γィエD2O decrease rapidly with annealing temperature. With decreasing γ, the electrical resistivity increases rapidly from 6x10ィイD1-1ィエD1 to 10ィイD14ィエD1 μΩcm.(3) Layered Ni/NiO films : Sifted MH loops are observed in bilayered films. With increase in NiO layer thickness, exchange field(HィイD2exィエD2) coercive force (HィイD2cィエD2) and magetoresistance (Δρ/ρ) increases. HィイD2exィエD2 increase with decrease in the Ni layer thickness. With increase in the NiO layer thickness, the Ni layer thickness at which the field of appearing HィイD2exィエD2 increases.(4) Layered Ni/Cu/Ni/NiO films : Shifted and asymmetrical MH loops have been observed. The latter indicated two ferromagnetic Ni layers have been surely separated by the Cu layer. HィイD2exィエD2 and HィイD2cィエD2 tend to increase with Cu layer thickness.
期刊论文(11)
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会议论文
河本 修,中川泰通,小野文久: "スパッタ法によるNi-O膜の結晶構造と磁気特性"粉体および粉末冶金. 46. 797-800 (1999)
Osamu Kawamoto、Yasumichi Nakakawa、Fumihisa Ono:“溅射制备的 Ni-O 薄膜的晶体结构和磁性能”粉末和粉末冶金学 46. 797-800 (1999)。
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11
    Studies on the magnetic anisotropy in single-layer films and magnetic interaction in bilayer films :
    • 批准号:
      13650761
    • 项目类别:
      Grant-in-Aid for Scientific Research (C)
    • 资助金额:
      $1.54万
    • 财政年份:
      2001
    • 负责人:
      KOHMOTO Osamu
    • 依托单位:
    STUDY OF MAGNETIC ANISOTROPY OF MAGNETIC RECORDING MEDIA USING FMR
    • 批准号:
      05650675
    • 项目类别:
      Grant-in-Aid for General Scientific Research (C)
    • 资助金额:
      $1.09万
    • 财政年份:
      1993
    • 负责人:
      KOHMOTO Osamu
    • 依托单位:
    海外基金