Evaluation of Wettability for Microelectronics Materials Based on Dynamic Wetting Model
Evaluation of Wettability for Microelectronics Materials Based on Dynamic Wetting Model
批准号:
11650744
负责人:
YASUDA Kiyokazu
金额:
$2.3万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (C)
财政年份:
1999
资助国家:
日本
项目状态:
已结题
起止时间:
1999 至 2000
中文摘要
1.对接触角和动态现象进行了分析,利用新引进的PC机实现了力和接触角的连续测量集成系统的自动控制。通过弯月面轮廓和力-时间曲线计算接触角和表面张力,考虑了其动态现象。并对拉普拉斯方程在平衡态下的适用性进行了比较判断。考虑固液界面流动和润湿运动引起的边界条件变化,进行了基于动态润湿模型的热模拟三维热分析。阐明了润湿性评价试验方法的适用性,以及润湿性评价体系、样品和焊膏的适用性要求,并对评价的适用性进行了判断。重点阐述了零点漂移现象、评价参数的有效性、侧向润湿时间阈值、焊膏体积以及电镀对润湿性的改善。
英文摘要
Research was conducted in this year as follows.1.Analysis of contact angle and dynamic phenomena Automatic control of continuos measurement of force and contact angle by integrated system was done by newly introduced personal computer. Calculating contact angle and surface tension through meniscus contour and force-time curve, its dynamic phenomena was considered. Moreover applicability of Laplace's equation under equilibrium state was judged in comparison.2. Thermals simulation 3-dimensional thermal analysis based on dynamic wetting model was done by considering boundary condition change because of solid-liquid interface movement by flow and wetting.3. Clarification of applicability as wetting evaluation test method Requirements as proper evaluation system of wettability and those of specimen and solder paste were clarified, and applicability of the evaluation was judged. Especially zero-shift phenomena, validity of evaluation parameter, threshold of side wetting time, volume of solder paste, and wetting improvement by plating were clarified.
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安田清和,赤永秀明,藤本公三,仲田周次: "リフロー現象のIn-situ観察に基づくぬれ挙動の実験的検討"第7回エレクトロニクスにおけるマイクロ接合・実装技術シンポジウム論文集. 7. 363-368 (2001)
Kiyokazu Yasuda、Hideaki Akanaga、Kozo Fujimoto、Shuji Nakata:“基于回流现象原位观察的润湿行为的实验研究”第七届电子微接合和封装技术研讨会论文集 7. 363-368 (2001)。
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K.Yasuda,T.Kitada,K.Fujimoto,S.Nakata: "Numerical Analysis of Meniscus Geometry and Wetting Force for Wettability Evaluation in Reflow-mode Wetting Balance Test"Proc.3rd International Conference "Micro Materials 2000", Berlin, April 2000. 3. 430-433 (2000
K.Yasuda、T.Kitada、K.Fujimoto、S.Nakata:“回流焊模式润湿平衡测试中用于润湿性评估的弯液面几何形状和润湿力的数值分析”Proc.3rd 国际会议“Micro Materials 2000”,柏林,4 月
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K.Yasuda,H.Ahamlzu F.Fujimoto,S.Nakata: "Evaluation of Wettability for Microelectronic Materials by Reflow-mode Wetting Balance Test"Proc.26th IEEE/CPMT International Electronics Manufacturing Technology Symposium IEMT 2000. 26. 247-252 (2000)
K.Yasuda,H.Ahamlzu F.Fujimoto,S.Nakata:“通过回流模式润湿平衡测试评估微电子材料的润湿性”Proc.26th IEEE/CPMT 国际电子制造技术研讨会 IEMT 2000. 26. 247-252 (
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K.Yasuda,H.Akamizu,K.Fujimoto,S.Nakata: "Evaluation of Wettability for Microelectronic Materials by Reflow-mode Wetting Balance Test"Proc.26th IEEE/CPMT International Electronics Manufacturing Technology Symposium IEMT 2000,Santa Clara, Oct.2000. 26. 247-
K.Yasuda、H.Akamizu、K.Fujimoto、S.Nakata:“通过回流模式润湿平衡测试评估微电子材料的润湿性”Proc.26th IEEE/CPMT 国际电子制造技术研讨会 IEMT 2000,圣克拉拉,10 月
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共 13 条
Clarification and Emergence of Self-replication Phenomena in Microelectronic Materials
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批准号:20560671
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项目类别:Grant-in-Aid for Scientific Research (C)
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资助金额:$3.0万
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财政年份:2008
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负责人:YASUDA Kiyokazu
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依托单位:
Microfabrication and Joining by Field Evaporation Mechanism
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批准号:03805063
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项目类别:Grant-in-Aid for General Scientific Research (C)
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资助金额:$1.09万
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财政年份:1991
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负责人:YASUDA Kiyokazu
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依托单位: